Influence of sputter damage on the XPS analysis of metastable nanocomposite coatings von Lewin, Erik, Gorgoi, Mihaela, Schäfers, Franz, Svensson, Svante, Jansson, Ulf

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Optical constants of sputtered beryllium thin films determined from photoabsorption measurements in the spectral range 20.4–250 eV von Svechnikov, Mikhail, Chkhalo, Nikolay, Lopatin, Alexey, Pleshkov, Roman, Polkovnikov, Vladimir, Salashchenko, Nikolay, Schäfers, Franz, Sertsu, Mewael G., Sokolov, Andrey, Tsybin, Nikolay

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Impact of B4C co-sputtering on structure and optical performance of Cr/Sc multilayer X-ray mirrors von Ghafoor, Naureen, Eriksson, Fredrik, Aquila, Andrew, Gullikson, Eric, Schäfers, Franz, Greczynski, Grezgorz, Birch, Jens

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Chemical State of Chromium, Sulfur, and Iron in Sewage Sludge Ash based Phosphorus Fertilizers von Vogel, Christian, Radtke, Martin, Reinholz, Uwe, Schäfers, Franz, Adam, Christian

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Soft X‐ray varied‐line‐spacing gratings fabricated by near‐field holography using an electron beam lithography‐written phase mask von Lin, Dakui, Liu, Zhengkun, Dietrich, Kay, Sokolov, Andréy, Sertsu, Mewael Giday, Zhou, Hongjun, Huo, Tonglin, Kroker, Stefanie, Chen, Huoyao, Qiu, Keqiang, Xu, Xiangdong, Schäfers, Franz, Liu, Ying, Kley, Ernst-Bernhard, Hong, Yilin

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Hard x-ray photoemission using standing-wave excitation applied to the MgO/Fe interface von Döring, Sven, Schönbohm, Frank, Berges, Ulf, Schreiber, Reinert, Bürgler, Daniel E., Schneider, Claus M., Gorgoi, Mihaela, Schäfers, Franz, Papp, Christian, Balke, Benjamin, Fadley, Charles S., Westphal, Carsten

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Soft x-ray reflectometry, hard x-ray photoelectron spectroscopy and transmission electron microscopy investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks von Filatova, Elena O, Kozhevnikov, Igor V, Sokolov, Andrey A, Ubyivovk, Evgeniy V, Yulin, Sergey, Gorgoi, Mihaela, Schäfers, Franz

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Investigation of interface properties of Ni/Cu multilayers by high kinetic energy photoelectron spectroscopy von Granroth, Sari, Knut, Ronny, Marcellini, Moreno, Andersson, Gabriella, Svensson, Svante, Karis, Olof, Gorgoi, Mihaela, Schäfers, Franz, Braun, Walter, Eberhardt, Wolfgang, Olovsson, Weine, Holmström, Erik, Mårtensson, Nils

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Interface engineering of short-period Ni/V multilayer X-ray mirrors von Eriksson, Fredrik, Ghafoor, Naureen, Schäfers, Franz, Gullikson, Eric M., Birch, Jens

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Atomic scale interface engineering by modulated ion-assisted deposition applied to soft x-ray multilayer optics von Eriksson, Fredrik, Ghafoor, Naureen, Schäfers, Franz, Gullikson, Eric M, Aouadi, Samir, Rohde, Susanne, Hultman, Lars, Birch, Jens

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Broadband Mo∕Si multilayer transmission phase retarders for the extreme ultraviolet von Wang, Zhanshan, Wang, Hongchang, Zhu, Jingtao, Zhang, Zhong, Xu, Yao, Zhang, Shumin, Wu, Wenjuan, Wang, Fengli, Wang, Bei, Liu, Liqin, Chen, Lingyan, Michette, Alan G., Pfauntsch, Slawka J., Keith Powell, A., Schäfers, Franz, Gaupp, Andreas, MacDonald, Mike

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Extreme ultraviolet broadband Mo ∕ Y multilayer analyzers von Wang, Zhanshan, Wang, Hongchang, Zhu, Jingtao, Xu, Yao, Zhang, Shumin, Li, Cunxia, Wang, Fengli, Zhang, Zhong, Wu, Yongrong, Cheng, Xinbin, Chen, Lingyan, Michette, Alan G., Pfauntsch, Slawka J., Powell, A. Keith, Schäfers, Franz, Gaupp, Andreas, MacDonald, Mike

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Electronic properties of Co2MnSi thin films studied by hard x-ray photoelectron spectroscopy von Ouardi, Siham, Gloskovskii, Andrei, Balke, Benjamin, Jenkins, Catherine A, Barth, Joachim, Fecher, Gerhard H, Felser, Claudia, Gorgoi, Mihaela, Mertin, Marcel, Schäfers, Franz, Ikenaga, Eiji, Yang, Ke, Kobayashi, Keisuke, Kubota, Takahide, Oogane, Mikihiko, Ando, Yasuo

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The crystal monochromator beamline KMC-1 at BESSY II von Schäfers, Franz

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Reflectance and Resolution of Multilayer Monochromators for Photon Energies from 400 - 6000 eV von Braun, Stefan, Gawlitza, Peter, Menzel, Maik, Leson, Andreas, Mertin, Marcel, Schafers, Franz

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High-reflection Mo/Be/Si multilayers for EUV lithography von Chkhalo, Nikolai I, Gusev, Sergei A, Nechay, Andrey N, Pariev, Dmitry E, Polkovnikov, Vladimir N, Salashchenko, Nikolai N, Schäfers, Franz, Sertsu, Mewael G, Sokolov, Andrey, Svechnikov, Mikhail V, Tatarsky, Dmitry A

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Broadband multilayer polarizers for the extreme ultraviolet von Wang, Zhanshan, Wang, Hongchang, Zhu, Jingtao, Wang, Fengli, Gu, Zhongxiang, Chen, Lingyan, Michette, Alan G., Powell, A. Keith, Pfauntsch, Sławka J., Schäfers, Franz

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Optimized highly efficient multilayer-coated blazed gratings for the tender X-ray region von Sokolov, Andrey, Huang, Qiushi, Senf, Friedmar, Feng, Jiangtao, Lemke, Stephanie, Alimov, Svyatoslav, Knedel, Jeniffa, Zeschke, Thomas, Kutz, Oliver, Seliger, Tino, Gwalt, Grzegorz, Schäfers, Franz, Siewert, Frank, Kozhevnikov, Igor V, Qi, Runze, Zhang, Zhong, Li, Wenbin, Wang, Zhanshan

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Impact of B_4C co-sputtering on structure and optical performance of Cr/Sc multilayer X-ray mirrors von Ghafoor, Naureen, Eriksson, Fredrik, Aquila, Andrew, Gullikson, Eric, Schäfers, Franz, Greczynski, Grzegorz, Birch, Jens

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Stable high-reflection Be/Mg multilayer mirrors for solar astronomy at 30.4  nm von Polkovnikov, Vladimir N, Chkhalo, Nikolai I, Pleshkov, Roman S, Salashchenko, Nikolai N, Schäfers, Franz, Sertsu, Mewael G, Sokolov, Andrey, Svechnikov, Mikhail V, Zuev, Sergei Yu

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