Treffer 1 - 3 von 3 für Suche 'Scarfogliere, B.', Suchdauer: 0,62s Treffer weiter einschränken
  1. 1
    Reduction of post exposure delay time and contamination sensitivity in chemically amplified resists: application for lithography using off-line environment

    Reduction of post exposure delay time and contamination sensitivity in chemically amplified resists: application for lithography using off-line environment von Pain, L., Scarfogliere, B., Tedesco, S., Gourgon, C., Coulomb, J.P., Morin, M., Ribeiro, M.

    Veröffentlicht in Microelectronic engineering

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  2. 2
    Reduction of post exposure delay time and contaminations sensitivity in chemically amplifies resists application for lithography using off line environment

    Reduction of post exposure delay time and contaminations sensitivity in chemically amplifies resists application for lithography using off line environment von Pain, L., Scarfogliere, B., Tedesco, S., Gourgon, C., Coulomb, Jp, Morin, M., Ribeiro, M.

    Veröffentlicht in Microelectronic engineering

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  3. 3
    Resolution limit of negative tone chemically amplified resist used for hybrid lithography: Influence of the molecular weight

    Resolution limit of negative tone chemically amplified resist used for hybrid lithography: Influence of the molecular weight von Pain, L., Higgins, C., Scarfoglière, B., Tedesco, S., Dal’Zotto, B., Gourgon, C., Ribeiro, M., Kusumoto, T., Suetsugu, M., Hanawa, R.


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