Design, Construction, and Test of HTS/LTS Hybrid Dipole von Gupta, Ramesh, Anerella, Michael, Cozzolino, John, Joshi, Piyush, Sampson, William, Wanderer, Peter, Kolonko, James, Larson, Delbert, Scanlan, Ron, Weggel, R., Willen, Erich

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Common Coil Dipoles for Future High Energy Colliders von Gupta, Ramesh, Anerella, Michael, Cozzolino, John, Sampson, William, Schmalzle, Jesse, Wanderer, Peter, Kolonko, James, Larson, Delbert, Scanlan, Ron, Weggel, Robert J., Willen, Erich, Maineri, Nicholas

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Field Compensation in Electron-Ion Collider Magnets With a Passive Superconducting Shield von Gupta, Ramesh, Joshi, Shresht, Parker, Brett, Sampson, William, Chouhan, Shailendra, Kahn, Stephen, Kolonko, James, Larson, Delbert, Scanlan, Ron, Weggel, Robert J., Willen, Erich

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Modular High Field Quadrupole Design for Electron-Ion Collider von Gupta, Ramesh, Anerella, Michael, Cozzolino, John, Parker, Brett, Chouhan, Shailendra, Kahn, Stephen, Kolonko, James, Larson, Delbert, Scanlan, Ron, Weggel, Robert J., Willen, Erich

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Strand critical current degradation in Nb3Sn Rutherford cables von BARZI, Emanuela, FRATINI, Michela, HIGLEY, Hugh C, SCANLAN, Ron M, YAMADA, Ryuji, ZLOBIN, Alexander V

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Results on mono element internal tin Nb3Sn conductors (MEIT) with Nb7.5ta and Nb(1Zr + Ox) filaments von ZEITLIN, Bruce A, GREGORY, Eric, MARTE, Jud, BENZ, Mark, PYON, Tae, SCANLAN, Ron, DIETDERICH, Dan

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A preliminary design for a one GHz NMR spectrometer magnet von Wang, S.-T., Wahrer, R., Anet, F., Chen, C.J., Juang, Y.F., Dell'Orco, D., Scanlan, R., Taylor, C., Green, M.A., Slack, D., Ekin, J., Campana, N.

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Single-Cell Analysis Suggests that Ongoing Affinity Maturation Drives the Emergence of Pemphigus Vulgaris Autoimmune Disease von Cho, Alice, Caldara, Amber L., Ran, Nina A., Menne, Zach, Kauffman, Robert C., Affer, Maurizio, Llovet, Alexandra, Norwood, Carson, Scanlan, Aaron, Mantus, Grace, Bradley, Bridget, Zimmer, Stephanie, Schmidt, Thomas, Hertl, Michael, Payne, Aimee S., Feldman, Ron, Kowalczyk, Andrew P., Wrammert, Jens

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ETCH REACTOR SUITABLE FOR ETCHING HIGH ASPECT RATIO FEATURES von ZHOU, XIAOPING, SCANLAN, DECLAN, TILGER, RON, MATYUSHKIN, ALEXANDER, LEHMANN, THORSTEN, ABOOAMERI, FARID, RUPF, JAN, OSWALD, MANFRED, MALETTA, FRANCESCO, MEYE, MARKUS, DINEV, JIVKO, LEUCKE, UWE, KOOSAU, DENIS

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ETCH REACTOR SUITABLE FOR ETCHING HIGH ASPECT RATIO FEATURES von LEHMANN THORSTEN, MATYUSHKIN ALEXANDER, RUPF JAN, SCANLAN DECLAN, DINEV JIVKO, ZHOU XIAOPING, OSWALD MANFRED, TILGER RON, ABOOAMERI FARID, LEUCKE UWE, MALETTA FRANCESCO, MEYE MARKUS, KOOSAU DENIS

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ETCH REACTOR SUITABLE FOR ETCHING HIGH ASPECT RATIO FEATURES von ZHOU, XIAOPING, SCANLAN, DECLAN, TILGER, RON, MATYUSHKIN, ALEXANDER, LEHMANN, THORSTEN, ABOOAMERI, FARID, RUPF, JAN, OSWALD, MANFRED, MALETTA, FRANCESCO, MEYE, MARKUS, DINEV, JIVKO, LEUCKE, UWE, KOOSAU, DENIS

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Etch reactor suitable for etching high aspect ratio features von ZHOU, XIAOPING, SCANLAN, DECLAN, TILGER, RON, MATYUSHKIN, ALEXANDER, LEHMANN, THORSTEN, ABOOAMERI, FARID, RUPF, JAN, OSWALD, MANFRED, MALETTA, FRANCESCO, MEYE, MARKUS, DINEV, JIVKO, LEUCKE, UWE, KOOSAU, DENIS

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Etch reactor suitable for etching high aspect ratio features von LEHMANN THORSTEN, MATYUSHKIN ALEXANDER, RUPF JAN, SCANLAN DECLAN, DINEV JIVKO, ZHOU XIAOPING, OSWALD MANFRED, TILGER RON, ABOOAMERI FARID, LEUCKE UWE, MALETTA FRANCESCO, MEYE MARKUS, KOOSAU DENIS

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ETCH REACTOR SUITABLE FOR ETCHING HIGH ASPECT RATIO FEATURES von LEHMANN THORSTEN, MATYUSHKIN ALEXANDER, RUPF JAN, SCANLAN DECLAN, DINEV JIVKO, ZHOU XIAOPING, OSWALD MANFRED, TILGER RON, ABOOAMERI FARID, LEUCKE UWE, MALETTA FRANCESCO, MEYE MARKUS, KOOSAU DENIS

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Etch reactor suitable for etching high aspect ratio features von ZHOU, XIAOPING, SCANLAN, DECLAN, TILGER, RON, MATYUSHKIN, ALEXANDER, LEHMANN, THORSTEN, ABOOAMERI, FARID, RUPF, JAN, OSWALD, MANFRED, MALETTA, FRANCESCO, MEYE, MARKUS, DINEV, JIVKO, LEUCKE, UWE, KOOSAU, DENIS

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