Treffer 1 - 20 von 170 für Suche 'Scaman, Michael E.', Suchdauer: 0,82s Treffer weiter einschränken
  1. 1
    Computer vision for automatic inspection of complex metal patterns on multichip modules (MCM-D)

    Computer vision for automatic inspection of complex metal patterns on multichip modules (MCM-D) von Scaman, M.E., Economikos, L.


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  2. 2
    Computer vision for automatic inspection of a high density grid of pads on multi-chip modules (MCM-D) : Michael E. Scaman, Laertis Economikos and Julius Lambright. IEEE Transactions on Components, Packaging, and Manufacturing Technology—Part B, 17, 3, 291 (August 1994)

    Computer vision for automatic inspection of a high density grid of pads on multi-chip modules (MCM-D) : Michael E. Scaman, Laertis Economikos and Julius Lambright. IEEE Transactions on Components, Packaging, and Manufacturing Technology—Part B, 17, 3, 291 (August 1994)


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  3. 3
    Dissertation abstracts

    Dissertation abstracts von Rehman, Asim Ur, Chi, Chante, Scaman, Michael E.

    Veröffentlicht in Machine vision and applications

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  4. 4
    Iterative method for refining integrated circuit layout using compass optical proximity correction (OPC)

    Iterative method for refining integrated circuit layout using compass optical proximity correction (OPC) von SCAMAN MICHAEL E

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  5. 5
    Iterative method for refining integrated circuit layout using compass optical proximity correction (OPC)

    Iterative method for refining integrated circuit layout using compass optical proximity correction (OPC) von Scaman, Michael E

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  6. 6
    ITERATIVE METHOD FOR REFINING INTEGRATED CIRCUIT LAYOUT USING COMPASS OPTICAL PROXIMITY CORRECTION (OPC)

    ITERATIVE METHOD FOR REFINING INTEGRATED CIRCUIT LAYOUT USING COMPASS OPTICAL PROXIMITY CORRECTION (OPC) von SCAMAN MICHAEL E

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  7. 7
    Iterative method for refining integrated circuit layout using compass optical proximity correction (OPC)

    Iterative method for refining integrated circuit layout using compass optical proximity correction (OPC) von SCAMAN MICHAEL E

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  8. 8
    Iterative method for refining integrated circuit layout using compass optical proximity correction (OPC)

    Iterative method for refining integrated circuit layout using compass optical proximity correction (OPC) von Scaman, Michael E

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  9. 9
    ITERATIVE METHOD FOR REFINING INTEGRATED CIRCUIT LAYOUT USING COMPASS OPTICAL PROXIMITY CORRECTION (OPC)

    ITERATIVE METHOD FOR REFINING INTEGRATED CIRCUIT LAYOUT USING COMPASS OPTICAL PROXIMITY CORRECTION (OPC) von SCAMAN MICHAEL E

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  10. 10
    WIRE TESTING STRUCTURE (WIRE TESTING STRUCTURE DETERMINING OPEN CIRCUIT AND SHORT-CIRCUIT IN SEMICONDUCTOR DEVICE) AND METHOD THEREFOR

    WIRE TESTING STRUCTURE (WIRE TESTING STRUCTURE DETERMINING OPEN CIRCUIT AND SHORT-CIRCUIT IN SEMICONDUCTOR DEVICE) AND METHOD THEREFOR von SCAMAN MICHAEL E, YANAGISAWA TOSHIAKI

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  11. 11
    Wiring test structures for determining open and short circuits in semiconductor devices

    Wiring test structures for determining open and short circuits in semiconductor devices von SCAMAN MICHAEL E, YANAGISAWA TOSHIAKI

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  12. 12
    Wiring test structures for determining open and short circuits in semiconductor devices

    Wiring test structures for determining open and short circuits in semiconductor devices von Scaman, Michael E, Yanagisawa, Toshiaki

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  13. 13
    Simplified contactless test of MCM thin film I/O nets using a plasma

    Simplified contactless test of MCM thin film I/O nets using a plasma von SCAMAN, MICHAEL E

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  14. 14
    Calibration and verification structures for use in optical proximity correction

    Calibration and verification structures for use in optical proximity correction von VISWANATHAN RAMYA, SCAMAN MICHAEL E, ABDO AMR Y, PARK OSEO, HAFFNER HENNING

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  15. 15
    Simplified contactless test of MCM thin film I/O nets using a plasma

    Simplified contactless test of MCM thin film I/O nets using a plasma von SCAMAN, MICHAEL E

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  16. 16
    Calibration and verification structures for use in optical proximity correction

    Calibration and verification structures for use in optical proximity correction von Viswanathan, Ramya, Abdo, Amr Y, Haffner, Henning, Park, Oseo, Scaman, Michael E

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  17. 17
    System and method for testing pattern sensitive algorithms for semiconductor design

    System and method for testing pattern sensitive algorithms for semiconductor design von SCAMAN MICHAEL E, ZHONG SHI, DEMARIS DAVID L, DUNHAM TIMOTHY G, LEIPOLD WILLIAM C, MAYNARD DANIEL N

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  18. 18
    System and method for testing pattern sensitive algorithms for semiconductor design

    System and method for testing pattern sensitive algorithms for semiconductor design von DeMaris, David L, Dunham, Timothy G, Leipold, William C, Maynard, Daniel N, Scaman, Michael E, Zhong, Shi

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  19. 19
    MEEF REDUCTION BY ELONGATION OF SQUARE SHAPES

    MEEF REDUCTION BY ELONGATION OF SQUARE SHAPES von SCAMAN MICHAEL E, DUNN DERREN N, HAFFNER HENNING, CROUSE MICHAEL M

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  20. 20
    CALIBRATION AND VERIFICATAION STRUCTURES FOR USE IN OPTICAL PROXIMITY CORRECTION

    CALIBRATION AND VERIFICATAION STRUCTURES FOR USE IN OPTICAL PROXIMITY CORRECTION von VISWANATHAN RAMYA, SCAMAN MICHAEL E, ABDO AMR Y, PARK OSEO, HAFFNER HENNING

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