Positive pulse bias method for a high-throughput PBII processing system von Ikehata, T, Shioya, K, Sato, N.Y, Yukimura, K

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Sheath formation and ion flux distribution inside the trench in plasma-based ion implantation von Ikehata, T., Shioya, K., Araki, T., Sato, N.Y., Mase, H., Yukimura, K.

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Positive pulse bias method in plasma-based ion implantation von Ikehata, T., Shimatsu, K., Sato, N.Y., Mase, H.

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Erratum to: Duodenum-Stomach Anastomosis: a New Technique for Exocrine Drainage in Pancreas Transplantation von Linhares, M. M., Beron, R. I., Gonzalez, A. M., Tarazona, C., Salzedas, A., Rangel, E. B., Sá, J. R., Melaragno, C., Goldman, S. M., Souza, M. G., Sato, N. Y., Matos, D., Lopes-Filho, G. J., Medina, J. O.

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Magnetic resonance cholangiography in the diagnosis of biliary complications after orthotopic liver transplantation von Linhares, M.M, Gonzalez, A.M, Goldman, S.M, Coelho, R.D.S, Sato, N.Y, Moura, R.M.A.M, Silva, M.H.G, Lanzoni, V.P, Salzedas, A, Serra, C.B, Succi, T, D'Ippolito, G, Szejnfeld, J, Triviño, T

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Measurement of ion current distribution on a three-dimensional workpiece in the positive pulse bias PBII von Ikehata, T., Shioya, K., Sato, N.Y., Yukimura, K.

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A novel laser technique for constructing a plasma micro-undulator and a compact X-ray source von Ikehata, T., Suzuki, Y., Nagai, R., Sadamoto, Y., Sato, N.Y., Mase, H.

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Plasma centrifuge for separation of metal elements and isotopes von Ikehata, T., Oohashi, K., Sato, N.Y., Tanabe, T., Mase, H.

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Selective Encrgy Contro1 0f cyclotron ions incient upon the substrate von Sato, N.Y., Ikehata, T., Mase, H.

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29p-XH-6 Effects of a conducting mesh on driving characteristics of a rotating plasma gun von Ikehata, T., Sato, H., Sato, N.Y., Tanabe, T, Mase, H.

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Sheath dynamics in the Plasma Based Ion lmplantation(PBll)under the voltage pulse with different Waveforms von Ikehata, T., Maehara, T., Araki, T., Terao, M., Sato, N.Y., Tanabe, T., Mase, H.

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Selective Energy Control of cyclotron ions incident upon the substrate von Nakamori, H., Kuroda, S., Sato, N.Y., Tanabe, T., Ikehata, T., Mase, H.

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Ion Energy Spectra in Pulse-Modulated Mixture Plasma von SATO, N.Y, HASHIMOTO, Y., IKEHATA, T., TANABE, T., MASE, H.

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29a-YF-6 Potential Structure in Diode Discharges von Mase, H, Sato, N.Y, Tanabe, T, Ikehata, T

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29p-XH-1 Production of Si-Fullernene Compound Materials by Controlling Plasma von Motegi, T., Hirata, T., Hatakeyama, R., Oku, T., Mieno, T., Sato, N.Y., Mase, H., Niwano, M., Miyamoto, N., Sato, N.

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23aXF-3 von 佐藤, 直幸, 池畑, 隆, 真瀬, 寛

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29p-XH-6 回転プラズマ銃の駆動特性に及ぼすメッシュの効果 von 池畑, 隆, 佐藤, 博文, 佐藤, 直幸, 田辺, 利夫, 真瀬, 寛

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23aXF-4 基板入射する今イクロトロンイオンの選択的エネルギー制御 : イオンフラックスの測定 von 中森, 英隆, 黒田, 真吾, 佐藤, 直幸, 田辺, 利夫, 池畑, 隆, 真瀬, 寛

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23aXF-2 プラズマイオン注入における電極シースの挙動とパルス波形 von 池畑, 隆, 前原, 匡志, 荒木, 俊也, 寺尾, 光央, 佐藤, 直之, 田辺, 利夫, 真瀬, 寛

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29p-XH-1 プラズマ制御によるSi-フラーレン複合物質の創製 von 茂木, 則行, 平田, 孝道, 畠山, 力三, 奥, 健夫, 三重野, 哲, 佐藤, 直幸, 真瀬, 寛, 庭野, 道夫, 宮本, 信雄, 佐藤, 徳芳

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