Fake news research trends, linkages to generative artificial intelligence and sustainable development goals von Raman, Raghu, Kumar Nair, Vinith, Nedungadi, Prema, Kumar Sahu, Aditya, Kowalski, Robin, Ramanathan, Sasangan, Achuthan, Krishnashree

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ALD of Hafnium Oxide Thin Films from Tetrakis(ethylmethylamino)hafnium and Ozone von Liu, Xinye, Ramanathan, Sasangan, Longdergan, Ana, Srivastava, Anuranjan, Lee, Eddie, Seidel, Thomas E., Barton, Jeffrey T., Pang, Dawen, Gordon, Roy G.

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Cyberbullying research — Alignment to sustainable development and impact of COVID-19: Bibliometrics and science mapping analysis von Achuthan, Krishnashree, Nair, Vinith Kumar, Kowalski, Robin, Ramanathan, Sasangan, Raman, Raghu

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Advancing cybersecurity and privacy with artificial intelligence: current trends and future research directions von Krishnashree Achuthan, Sasangan Ramanathan, Sethuraman Srinivas, Raghu Raman

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SrBi2Ta2O9 thin films made by liquid source metal-organic chemical vapor deposition von Zhu, Yongfei, Desu, Seshu B., Li, Tingkai, Ramanathan, Sasangan, Nagata, Masaya

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New Catalysts for Hydroprocessing: Bimetallic Oxynitrides von Ramanathan, Sasangan, Yu, C.Charles, Oyama, S.Ted

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Advances in ALD Equipment for sub-40nm Memory Capacitor Dielectrics: Precursor delivery, Materials and Processes von Karim, Zia, Senzaki, Yoshi, Ramanathan, Sasangan, Lindner, Johannes, Silva, Hugo, Dauelsberg, Martin

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New Catalysts for Hydroprocessing: Bimetallic Oxynitrides: II. Reactivity Studies von Ramanathan, Sasangan, Yu, C.Charles, Oyama, S.Ted

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Highly Conformal ALD of ZrO 2 at Higher Process Temperatures than the Conventinal TEMAZr-Based Process von Senzaki, Yoshi, Okuyama, Yoshi, Kim, Gi, Kim, H. Y., Barelli, Carl, Lindner, Johannes, Karim, Zia, Ramanathan, Sasangan

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High Performance ALD Reactor for High-k Films von Dalton, Jeremie, Kim, Hae Young, Zhang, Zhihong, Seidel, Tom, Karim, Zia, Ramanathan, Sasangan

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New Catalysts for Hydroprocessing: Bimetallic Oxynitrides MI–MII–O–N (MI, MII=Mo, W, V, Nb, Cr, Mn, and Co): Part I. Synthesis and Characterization von Yu, C.Charles, Ramanathan, Sasangan, Oyama, S.Ted

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Erratum: ALD of Hafnium Oxide Thin Films from Tetrakis(ethylmethylamino)hafnium and Ozone [J. Electrochem. Soc., 152, G213 (2005)] von Liu, Xinye, Ramanathan, Sasangan, Longdergan, Ana, Srivastava, Anuranjan, Lee, Eddie, Seidel, Thomas E., Barton, Jeffrey T., Pang, Dawen, Gordon, Roy G.

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Advanced Metal Gate Electrode Options Compatible with ALD and AVD® HfSiOx-Based Gate Dielectrics von Karim, Zia, Biossiere, Olivier, Lohe, Christoph, Zhang, Zhihong, Park, Woong, Manke, Christian, Baumann, Peter K., Dalton, Jeremie, Ramanathan, Sasangan, Lindner, Johannes, Seidel, Tom, Lehnen, Peer

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New Catalysts for Hydroprocessing: Bimetallic Oxynitrides MI–MII–O–N (MI, MII=Mo, W, V, Nb, Cr, Mn, and Co) von Yu, C.Charles, Ramanathan, Sasangan, Oyama, S.Ted

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TRANSIENT ENHANCED ATOMIC LAYER DEPOSITION von SRIVASTAVA, Anuranjan, KIM, Gi, Youl, LONDERGAN, Ana, SEIDEL, Thomas, E, RAMANATHAN, Sasangan

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SrBi 2 Ta 2 O 9 thin films made by liquid source metal-organic chemical vapor deposition von Zhu, Yongfei, Desu, Seshu B., Li, Tingkai, Ramanathan, Sasangan, Nagata, Masaya

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SURFACE MODIFICATION OF SEMICONDUCTORS USING ELECTROMAGNETIC RADIATION von FOGGIATO, GIOVANNI, ANTONIO, KHAN, ASHRAF, R, RAMANATHAN, SASANGAN

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Method for forming TiSiN thin film layer by using atomic layer deposition von RAMANATHAN SASANGAN, JANG YOUNG JIN, PARK WOONG, SIU GREG, SILVA HUGO, LU BRIAN, KIM GI YOUL

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Advances in ALD GST Process and Equipment for sub-20nm PCRAM Devices : Precursor delivery, GST Gapfill and Electrical Characterization von Karim, Zia, Yang, Lin, Mack, Jerry, Liu, Ming, Weber, Ulrich, Baumann, Peter, Ramanathan, Sasangan, Lu, Brian, Czubatyj, Wally, Hudgens, Stephen, Lowrey, Tyler

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METHOD FOR FORMING TiSiN THIN FILM LAYER BY USING ATOMIC LAYER DEPOSITION von RAMANATHAN SASANGAN, JANG YOUNG JIN, PARK WOONG, SIU GREG, SILVA HUGO, LU BRIAN, KIM GI YOUL

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