Gas cluster ion beam processing of gallium antimonide wafers for surface and sub-surface damage reduction von Li, X., Goodhue, W.D., Santeufeimio, C., Tetreault, T.G., MacCrimmon, R., Allen, L.P., Bliss, D., Krishnaswami, K., Sung, C.

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GaSb cluster ion beam processing of gallium antimonide wafers for surface and sub-surface damage reduction von Li, X, Goodhue, W D, Santeufeimio, C, Tetreaul, T G, MacCrimmon, R, Allen, L P, Bliss, D, Krishnaswami, K, Sung, C

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Development of gas cluster ion beam irradiation system with an orthogonal acceleration TOF instrument von Ichiki, K., Tamura, J., Seki, T., Aoki, T., Matsuo, J.

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Size effects of gas cluster ions on beam transport, amorphous layer formation and sputtering von Toyoda, Noriaki, Yamada, Isao

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Surface oxidation of Si assisted by irradiation with large gas cluster ion beam in an oxygen atmosphere von Ichiki, K., Ninomiya, S., Seki, T., Aoki, T., Matsuo, J.

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Numerical Simulation of Atomic Layer Oxidation of Silicon by Oxygen Gas Cluster Beams von MIZOTANI, Kohei, ISOBE, Michiro, KARAHASHI, Kazuhiro, HAMAGUCHI, Satoshi

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Sputtering Properties of Si by Size-Selected Ar Gas Cluster Ion Beam von Ichiki, Kazuya, Ninomiya, Satoshi, Sekia, Toshio, Aoki, Takaaki, Matsuo, Jiro

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