Advances in Patterning Materials for 193 nm Immersion Lithography von Sanders, Daniel P

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Accelerating materials discovery using artificial intelligence, high performance computing and robotics von Pyzer-Knapp, Edward O., Pitera, Jed W., Staar, Peter W. J., Takeda, Seiji, Laino, Teodoro, Sanders, Daniel P., Sexton, James, Smith, John R., Curioni, Alessandro

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Two-Dimensional Pattern Formation Using Graphoepitaxy of PS‑b‑PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication von Tsai, Hsinyu, Pitera, Jed W, Miyazoe, Hiroyuki, Bangsaruntip, Sarunya, Engelmann, Sebastian U, Liu, Chi-Chun, Cheng, Joy Y, Bucchignano, James J, Klaus, David P, Joseph, Eric A, Sanders, Daniel P, Colburn, Matthew E, Guillorn, Michael A

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A Simple and Efficient Synthesis of Functionalized Cyclic Carbonate Monomers Using a Versatile Pentafluorophenyl Ester Intermediate von Sanders, Daniel P, Fukushima, Kazuki, Coady, Daniel J, Nelson, Alshakim, Fujiwara, Masaki, Yasumoto, Manabu, Hedrick, James L

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Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers von Cheng, Joy Y., Rettner, Charles T., Sanders, Daniel P., Kim, Ho-Cheol, Hinsberg, William D.

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Hydrogen-Bonding Catalysts Based on Fluorinated Alcohol Derivatives for Living Polymerization von Coulembier, Olivier, Sanders, Daniel P, Nelson, Alshakim, Hollenbeck, Andrew N, Horn, Hans W, Rice, Julia E, Fujiwara, Masaki, Dubois, Philippe, Hedrick, James L

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Directed Self-Assembly of Silicon-Containing Block Copolymer Thin Films von Maher, Michael J, Rettner, Charles T, Bates, Christopher M, Blachut, Gregory, Carlson, Matthew C, Durand, William J, Ellison, Christopher J, Sanders, Daniel P, Cheng, Joy Y, Willson, C. Grant

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Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces von Kim, Ji Yeon, Liu, Philip, Maher, Michael J, Callan, Devon H, Bates, Christopher M, Carlson, Matthew C, Asano, Yusuke, Blachut, Gregory, Rettner, Charles T, Cheng, Joy Y, Sunday, Daniel F, Kline, R. Joseph, Sanders, Daniel P, Lynd, Nathaniel A, Ellison, Christopher J, Willson, C. Grant, Baiz, Carlos R

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Pattern Placement Accuracy in Block Copolymer Directed Self-Assembly Based on Chemical Epitaxy von Doerk, Gregory S, Liu, Chi-Chun, Cheng, Joy Y, Rettner, Charles T, Pitera, Jed W, Krupp, Leslie E, Topuria, Teya, Arellano, Noel, Sanders, Daniel P

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Synthesis of Symmetrical Trisubstituted Olefins by Cross Metathesis von Chatterjee, Arnab K, Sanders, Daniel P, Grubbs, Robert H

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Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist von Cheng, Joy Y, Sanders, Daniel P, Truong, Hoa D, Harrer, Stefan, Friz, Alexander, Holmes, Steven, Colburn, Matthew, Hinsberg, William D

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Prevention of Undesirable Isomerization during Olefin Metathesis von Hong, Soon Hyeok, Sanders, Daniel P, Lee, Choon Woo, Grubbs, Robert H

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A General Model for Selectivity in Olefin Cross Metathesis von Chatterjee, Arnab K, Choi, Tae-Lim, Sanders, Daniel P, Grubbs, Robert H

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Enabling complex nanoscale pattern customization using directed self-assembly von Doerk, Gregory S., Cheng, Joy Y., Singh, Gurpreet, Rettner, Charles T., Pitera, Jed W., Balakrishnan, Srinivasan, Arellano, Noel, Sanders, Daniel P.

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Interfacial Layers with Photoswitching Surface Energy for Block Copolymer Alignment and Directed Self-Assembly von Maher, Michael J., Bates, Christopher M., Durand, William J., Blachut, Gregory, Janes, Dustin W., Cheng, Joy Y., Sanders, Daniel P., Willson, C. Grant, Ellison, Christopher J.

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Synthesis and Characterization of Polycarbonate-containing All-organic High-χ Block Copolymers for Directed Self-assembly von Vora, Ankit, Chunder, Anindarupa, Tjio, Melia, Magbitang, Teddie, Lofano, Elizabeth, Arellano, Noel, Schmidt, Kristin, Nguyen, Khanh, Cheng, Joy, Sanders, Daniel P.

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Accessing New Materials through Polymerization and Modification of a Polycarbonate with a Pendant Activated Ester von Engler, Amanda C, Chan, Julian M. W, Coady, Daniel J, O’Brien, Jeannette M, Sardon, Haritz, Nelson, Alshakim, Sanders, Daniel P, Yang, Yi Yan, Hedrick, James L

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Orientation Control of Block Copolymers Using Surface Active, Phase-Preferential Additives von Vora, Ankit, Schmidt, Kristin, Alva, Gabriela, Arellano, Noel, Magbitang, Teddie, Chunder, Anindarupa, Thompson, Leslie E, Lofano, Elizabeth, Pitera, Jed W, Cheng, Joy Y, Sanders, Daniel P

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Directed Self-assembly of Topcoat-free, Integration-friendly High-χ Block Copolymers von Vora, Ankit, Chunder, Anindarupa, Tjio, Melia, Balakrishman, Srinivasan, Lofano, Elizabeth, Cheng, Joy, Sanders, Daniel P., Hirahara, Eri, Akiyama, Yasushi, Polishchuk, Orest, Paunescu, Margareta, Baskaran, Durairaj, Hong, SungEun, Lin, Guanyang

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