Dry Development Rinse Process (DDRP) & Materials (DDRM) For EUVL von Shibayama, Wataru, Shigaki, Shuhei, Nakajima, Makoto, Takeda, Satoshi, Onishi, Ryuji, Sakamoto, Rikimaru

Volltext

New Approach for ArFi Extension by Dry Development Rinse Process von Shibayama, Wataru, Shigaki, Shuhei, Takeda, Satoshi, Onishi, Ryuji, Nakajima, Makoto, Sakamoto, Rikimaru

Volltext

Novel Spin on Planarization Technology by Photo Curing SOC (P-SOC) von Endo, Takafumi, Sakamoto, Rikimaru, Hashimoto, Keisuke, Saito, Daigo, Nishimaki, Hirokazu, Karasawa, Ryo, Tokunaga, Hikaru

Volltext

Backexposure Effect in Chemically Amplified Resist Process upon Exposure to Extreme Ultraviolet Radiation von Kozawa, Takahiro, Tagawa, Seiichi, Ohnishi, Ryuji, Endo, Takafumi, Sakamoto, Rikimaru

Volltext

The Novel Solution for Negative Impact of Out-of-band and Outgassing by Top Coat Materials(OBPL) in EUVL von Sakamoto, Rikimaru, Fujitani, Noriaki, Onishi, Ryuji, Nishita, Tokio

Volltext

The Impact and Optimization of EUV Sensitive Si Hardmask for Sub-20nm Patterning in EUVL with NTD Process von Shigaki, Shuhei, Onishi, Ryuji, Yaguchi, Hiroaki, Shibayama, Wataru, Fujitani, Noriaki, Sakamoto, Rikimaru

Volltext

Development of Under Layer Material for EUV Lithography von Sakamoto, Rikimaru, Ho, Bang-Ching, Fujitani, Noriaki, Endo, Takafumi, Ohnishi, Ryuji

Volltext

Organic Underlayers for EUV Lithography von Guerrero, Dougllas J., Beaman, Carol, Sakamoto, Rikimaru, Endo, Takafumi, Ho, Bang-Ching

Volltext

A Study of an Organic Bottom Antireflective Coating for 157-nm Lithography von Irie, Shigeo, Shigematsu, Masato, Sakamoto, Rikimaru, Mizusawa, Kenichi, Nakajima, Yasuyuki, Itani, Toshiro

Volltext

Application of a New BARC Material for 157-nm Lithography von Shigematu, Masato, Irie, Shigeo, Sakamoto, Rikimaru, Kishioka, Takahiro, Mizusawa, Kenichi, Nakajima, Yasuyuki, Fujii, Kiyoshi

Volltext

Resist underlayer film-forming composition von Nishita, Tokio, Sakamoto, Rikimaru

Volltext bestellen

(Invited) The Novel Spin-on Hard Mask and Ultra Thin UL Material for EUVL von Sakamoto, Rikimaru, Yaguchi, Hiroaki, Shigaki, Syuhei, Sassa, Suguru, Fujitani, Noriaki, Endo, Takafumi, Onishi, Ryuji, Ho, Bang Ching

Volltext

New Approach for Reducing the Out of Band effect and Outgassing by Applying Top Coat Materials von Sakamoto, Rikimaru, Onishi, Ryuji, Fujitani, Noriaki, Ho, Bang-ching

Volltext

Backexposure Effect in Chemically Amplified Resist Process upon Exposure to Extreme Ultraviolet Radiation von Kozawa, Takahiro, Tagawa, Seiichi, Ohnishi, Ryuji, Endo, Takafumi, Sakamoto, Rikimaru

Volltext

Aqueous solution for resist pattern coating and pattern forming methods using the same von Nishita, Tokio, Sakamoto, Rikimaru

Volltext bestellen

Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same von Nishita, Tokio, Sakamoto, Rikimaru

Volltext bestellen

Coating solution for resist pattern coating and method for forming pattern von Nishita, Tokio, Sakamoto, Rikimaru

Volltext bestellen

Composition for forming resist overlayer film for EUV lithography von Endo, Takafumi, Ho, Bangching, Sakamoto, Rikimaru

Volltext bestellen

Photocurable composition and method for producing semiconductor device von Endo, Takafumi, Hashimoto, Keisuke, Tokunaga, Hikaru, Sakamoto, Rikimaru

Volltext bestellen

금속 산화물 레지스트 패턴 형성용 유기 수지 조성물 von TAKEDA SATOSHI, SAKAMOTO RIKIMARU

Volltext bestellen