Low Hysteresis Vanadium Dioxide Integrated on Silicon Using Complementary Metal‐Oxide Semiconductor Compatible Oxide Buffer Layer von Sahoo, Swayam Prakash, Bugnet, Matthieu, Infante, Ingrid Cañero, Pierron, Victor, Méchin, Laurence, Cervasio, Rebecca, Hemme, Pierre, Brubach, Jean‐blaise, Roy, Pascale, Fréchette, Luc, Lamirand, Anne, Vilquin, Bertrand

Volltext

Low Hysteresis Vanadium Dioxide Integrated on Silicon Using Complementary Metal‐Oxide Semiconductor Compatible Oxide Buffer Layer von Sahoo, Swayam Prakash, Bugnet, Matthieu, Infante, Ingrid Cañero, Pierron, Victor, Méchin, Laurence, Cervasio, Rebecca, Hemme, Pierre, Brubach, Jean‐Blaise, Roy, Pascale, Fréchette, Luc G., Lamirand, Anne D., Vilquin, Bertrand

Volltext