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  1. 1
    Process for vapour deposition of semiconductor layers on a substrate under vacuum, and device for carrying out the process

    Process for vapour deposition of semiconductor layers on a substrate under vacuum, and device for carrying out the process von BOIKO, ANATOLY GEORGIEVICH, LYSKO, LEONID GEORGIEVICH, ISHIMOV, VIKTOR MIKHAILOVICH, PRILEPOV, VLADIMIR DMITRIEVICH, ROTAR, ANATOLY IVANOVICH, BEKICHEVA, LJUBOV IVANOVNA, KOVTUNENKO, SVETLANA IVANOVNA, DANILJUK, SERGEI ANTONOVICH, PANASJUK, LEV MOISEEVICH, ZJUBRIK, ALEXEI IVANOVICH

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  2. 2
    METHOD OF VACUUM DEPOSITION OF SEMICONDUCTOR LAYERS AND APPARATUS FOR EFFECTING THIS METHOD

    METHOD OF VACUUM DEPOSITION OF SEMICONDUCTOR LAYERS AND APPARATUS FOR EFFECTING THIS METHOD von LEONID GEORGIEVICH LYSKO, ANATOLY GEORGIEVICH BOIKO, LJUBOV IVANOVNA BEKICHEVA, SVETLANA IVANOVNA KOVTUNENKO, ALEXEI IVANOVICH ZJUBRIK, ANATOLY IVANOVICH ROTAR, VLADIMIR DMITRIEVICH PRILEPOV, LEV MOISEEVICH PANASJUK, VIKTOR MIKHAILOVICH ISHIMOV, SERGEI ANTONOVICH DANILJUK

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