Treffer 1 - 7 von 7 für Suche 'SUNDLING DIANNE L', Suchdauer: 0,60s Treffer weiter einschränken
  1. 1
    Characterization of linewidth variation for single- and multiple-layer resist systems

    Characterization of linewidth variation for single- and multiple-layer resist systems von Bruce, J.A., Lin, B.J., Sundling, D.L., Lee, T.N.


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  2. 2
    Method to reduce plasma etch fluting

    Method to reduce plasma etch fluting von BRUCE JAMES A, MLYRIKO WALTER E, SUNDLING DIANNE L, JAGANNATHAN PREMLATHA J, BUSHEY MARY C

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  3. 3
    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus

    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus von Bowley, Jr, Reginald R, Carlos, Vincent J, Doran, James E, Knight, Stephen E, Leidy, Robert K, Machia, Keith J, Shaver, Joseph E, Sundling, Dianne L

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  4. 4
    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus

    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus von MACHIA KEITH J, KNIGHT STEPHEN E, SHAVER JOSEPH E, SUNDLING DIANNE L, BOWLEY, JR. REGINALD R, CARLOS VINCENT J, LEIDY ROBERT K, DORAN JAMES E

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  5. 5
    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus

    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus von Bowley, Jr, Reginald R, Carlos, Vincent J, Doran, James E, Knight, Stephen E, Leidy, Robert K, Machia, Keith J, Shaver, Joseph E, Sundling, Dianne L

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  6. 6
    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus

    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus von MACHIA KEITH J, KNIGHT STEPHEN E, SHAVER JOSEPH E, SUNDLING DIANNE L, BOWLEY, JR. REGINALD R, CARLOS VINCENT J, LEIDY ROBERT K, DORAN JAMES E

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  7. 7
    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus

    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus von MACHIA KEITH J, KNIGHT STEPHEN E, SHAVER JOSEPH E, BOWLEY REGINALD R, SUNDLING DIANNE L, CARLOS VINCENT J, LEIDY ROBERT K, DORAN JAMES E

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