Time-resolved measurement of radical populations in extreme-ultraviolet-light-induced hydrogen plasma von Liu, Chang, Tanaka, Nozomi, Zhu, Baojun, Nishihara, Katsunobu, Fujioka, Shinsuke, Sik Kang, Kyung, Suh, Youngduk, Kim, Jeong-Gil, Ozawa, Ken, Kubo, Minoru

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Optical Emission Spectroscopy (OES) measurement of EUV-induced plasma parameters in hydrogen von LIU, CHANG, TANAKA, NOZOMI, ZHU, BAOJUN, NISHIHARA, KATSUNOBU, FUJIOKA, SHINSUKE, KANG, KYUNGSIK, SUH, YOUNGDUK, KIM, JEONGGIL, OZAWA, KEN, KUBO, MINORU

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Two-photon laser-induced fluorescence of hydrogen atom in EUV photoionized plasma von Zhu, Baojun, Liu, Chang, Tanaka, Nozomi, Nishihara, Katsunobu, Fujioka, Shinsuke, Kang, Kyung Sik, Suh, Youngduk, Kim, Jeong-Gil, Ozawa, Ken, Kubo, Minoru

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Cleaning of tin layer on EUV multilayer mirrors by the EUV induced hydrogen plasma von Tanaka, Nozomi, Zhu, Baojun, Liu, Chang, Nishihara, Katsunobu, Fujioka, Shinsuke, Kang, Kyung Sik, Suh, Youngduk, Kim, Jeong-Gil, Ozawa, Ken, Kubo, Minoru

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Spectroscopic diagnostics of hydrogen radicals in EUV induced hydrogen plasma von LIU, CHANG, TANAKA, NOZOMI, ZHU, BAOJUN, KANG, KYUNGSIK, SUH, YOUNGDUK, KIM, JEONGGIL, OZAWA, KEN, TAKAGI, TAKESHI, KUBO, MINORU, FUJIOKA, SHINSUKE

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Cleaning of Sn layer in hydrogen plasma induced by intense pulsed EUV radiation von Tanaka, Nozomi, Zhu, Baojun, Liu, Chang, Kang, Kyung Sik, Suh, Youngduk, Kim, Jeong-Gil, Ozawa, Ken, Takagi, Takeshi, Kubo, Minoru, Fujioka, Shinsuke

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Two-photon laser-induced fluorescence of hydrogen atom in EUV photoionized plasma von Zhu, Baojun, Liu, Chang, Tanaka, Nozomi, Kang, Kyung Sik, Suh, Youngduk, Kim, Jeong-Gil, Ozawa, Ken, Takagi, Takeshi, Kubo, Minoru, Fujioka, Shinsuke

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APPARATUS FOR CLEANING AN EXTREME ULTRAVIOLET LIGHT CREATION CHAMBER von Suh, Youngduk, Jung, Jinwook, Kang, Sungwook, Shin, Sanggon, Dohyun, Jung, Lee, Seunghee

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Method of cleaning collector of EUV light source system von Pi, Jonghun, Kim, Hoonseop, Suh, Youngduk, Nam, Sangki, Kang, Daewon, Kim, Youngdo, Lee, Donghyub, Lim, Changsoon, Kang, Chansoo

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SEMICONDUCTOR FABRICATION APPARATUS von JUNG, JINWOOK, HAN, TAE-HYUN, CHOI, KUKBIN, KIM, JUNGHWAN, KIM, SANGHUN, KWON, OHKUG, PARK, SANGBEOM, HAN, DONGKYENG, SUH, YOUNGDUK

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METHOD OF CLEANING COLLECTOR OF EUV LIGHT SOURCE SYSTEM von KANG, Chansoo, PI, Jonghun, KIM, Hoonseop, SUH, Youngduk, LIM, Changsoon, KANG, Daewon, NAM, Sangki, KIM, Youngdo, LEE, Donghyub

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Extreme ultraviolet (EUV) collector inspection apparatus and method von Jeong, Yoojin, Kang, Kyungsik, Kim, Jeong-Gil, Suh, Youngduk, Matsuda, Yozo, Jang, Sungho, Lee, Dong-Hyub, Kim, Hochul, Lee, Seungkoo, Kim, Jinyong

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EXTREME ULTRAVIOLET (EUV) COLLECTOR INSPECTION APPARATUS AND METHOD von Jeong, Yoojin, Kang, Kyungsik, Kim, Jeong-Gil, Suh, Youngduk, Matsuda, Yozo, Jang, Sungho, Lee, Dong-Hyub, Kim, Hochul, Lee, Seungkoo, Kim, Jinyong

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apparatus for manufacturing semiconductor device von PARK SANGBEOM, KIM SANGHUN, HAN DONGKYENG, KWON OHKUG, SUH YOUNGDUK, HAN TAE HYUN, CHOI KUKBIN, KIM JUNGHWAN, JUNG JINWOOK

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