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  1. 1
    Conductive structure, especially for ICs, memories and optical components with nanometer size individual conductive elements, is produced

    Conductive structure, especially for ICs, memories and optical components with nanometer size individual conductive elements, is produced von ARONZON, BORIS ARONOVIC, STROMBACH, YAROSLAV IGOREVIC, VELICHOV, EVGENIJ PAVLOVIC, MEILICHOV, EVGENIJ ZALMANOVIC, PRICHODKO, KIRILL EVGEN'EVIC, DOLGYJ, DMITRIJ IOSIFOVIC, OLSANSKYJ, EVGENIJ DMITRIEVIC, GUROVIC, BORIS ARONOVIC, KULESOVA, EVGENIA ANATOL'EVNA, RYLKOV, VLADIMIR VASIL'EVIC, RYAZANCEV, EVGENIJ PETROVIC, DOMANTOVSKYJ, ALEXANDR GRIGOR'EVIC

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  2. 2
    Production of a lithographic drawing using electron or ion beam

    Production of a lithographic drawing using electron or ion beam von ARONZON, BORIS ARONOVIC, STROMBACH, YAROSLAV IGOREVIC, VELICHOV, EVGENIJ PAVLOVIC, MEILICHOV, EVGENIJ ZALMANOVIC, PRICHODKO, KIRILL EVGEN'EVIC, DOLGYJ, DMITRIJ IOSIFOVIC, OLSANSKYJ, EVGENIJ DMITRIEVIC, GUROVIC, BORIS ARONOVIC, KULESOVA, EVGENIA ANATOL'EVNA, RYLKOV, VLADIMIR VASIL'EVIC, RYAZANCEV, EVGENIJ PETROVIC, DOMANTOVSKYJ, ALEXANDR GRIGOR'EVIC

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