Localized defects in multilayer coatings von Stearns, D.G., Mirkarimi, P.B., Spiller, E.

Volltext

X-RAY-SCATTERING FROM INTERFACIAL ROUGHNESS IN MULTILAYER STRUCTURES von STEARNS, DG

Volltext

Nonspecular x-ray scattering in a multilayer-coated imaging system von Stearns, D. G., Gaines, D. P., Sweeney, D. W., Gullikson, E. M.

Volltext

Investigating the growth of localized defects in thin films using gold nanospheres von Mirkarimi, P. B., Stearns, D. G.

Volltext

The scattering of x rays from nonideal multilayer structures von STEARNS, D. G

Volltext

Stochastic model for thin film growth and erosion von STEARNS, D. G

Volltext

Multilayer mirror technology for soft-x-ray projection lithography von Stearns, D G, Rosen, R S, Vernon, S P

Volltext

Thermally induced structural modification of Mo-Si multilayers von STEARNS, D. G, STEARNS, M. B, CHENG, Y, STITH, J. H, CEGLIO, N. M

Volltext

High-resolution electron microscopy study of x-ray multilayer structures von PETFORD-LONG, A. K, STEARNS, M. B, CHANG, C.-H, NUTT, S. R, STEARNS, D. G, CEGLIO, N. M, HAWRYLUK, A. M

Volltext

Advancing the ion beam thin film planarization process for the smoothing of substrate particles von Mirkarimi, P.B., Spiller, E., Baker, S.L., Robinson, J.C., Stearns, D.G., Liddle, J.A., Salmassi, F., Liang, T., Stivers, A.R.

Volltext

Chirped multilayer coatings for increased x-ray throughput von VERNON, S. P, STEARNS, D. G, ROSEN, R. S

Volltext

Normal-incidence x-ray mirror for 7 nm von STEARNS, D. G, ROSEN, R. S, VERNON

Volltext

Multipass amplification of soft x rays in a laser cavity von CEGLIO, N. M, STEARNS, D. G, GAINES, D. P, HAWRYLUK, A. M, TREBES, J. E

Volltext

Method for repairing Mo/Si multilayer thin film phase defects in reticles for extreme ultraviolet lithography von Mirkarimi, P. B., Stearns, D. G., Baker, S. L., Elmer, J. W., Sweeney, D. W., Gullikson, E. M.

Volltext

Measurement of the expansion of picosecond laser-produced plasmas using resonance absorption profile spectroscopy von LANDEN, O. L, STEARNS, D. G, CAMPBELL, E. M

Volltext

An ion-assisted Mo-Si deposition process for planarizing reticle substrates for extreme ultraviolet lithography von Mirkarimi, P.B., Spiller, E.A., Stearns, D.G., Sperry, V., Baker, S.L.

Volltext

Electro-optic sampling of ultrashort high voltage pulses von STEARNS, D. G

Volltext

Practical approach for modeling extreme ultraviolet lithography mask defects von Gullikson, E. M., Cerjan, C., Stearns, D. G., Mirkarimi, P. B., Sweeney, D. W.

Volltext

Response of charge‐coupled devices to direct electron bombardment von Stearns, D. G., Wiedwald, J. D.

Volltext

Nonspecular scattering from extreme ultraviolet multilayer coatings von Stearns, D.G., Gullikson, E.M.

Volltext