Properties of purified direct steam grown silicon thermal oxides von Mack, Sebastian, Wolf, Andreas, Walczak, Alexandra, Thaidigsmann, Benjamin, Allan Wotke, Edgar, Spiegelman, Jeffrey J., Preu, Ralf, Biro, Daniel

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Surface Passivation of New Channel Materials Utilizing Hydrogen Peroxide and Hydrazine Gas von Holmes, Russell, Alvarez Jr, Dan, Kummel, Andrew C., Spiegelman, Jeffrey J., Edmonds, Mary, Sardashti, Kasra, Wolf, Steven

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Control polarity of gallium nitride on Si (111) using atomic layer annealing and thermal atomic layer deposition von Yun, SeongUk, Lee, Ping-Che, Spiegelman, Jeffrey, Kummel, Andrew C.

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Si-doped HZO and ZrO2 for hysteresis free high-k dielectric von Kashyap, Harshil, Lee, Ping-Che, Chae, Kisung, Passlack, Matthias, Yadav, Ajay K., Wong, Keith, Nemani, Srini, Yieh, Ellie, Spiegelman, Jeffrey, Cho, Kyeongjae, Khan, Asif Islam, Kummel, Andrew C.

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Impact of Tetrakis(ethylmethylamino)-based precursor and oxygen source selection on atomic layer deposition of ferroelectric HfxZr1-xO2 thin films von Kim, Jin-Hyun, Song, Siun, Narayan, Dushyant M., Le, Dan N., Huong Chu, Thi Thu, Lee, Minjong, Park, Geon, Lee, Seungbin, Kang, Jongmug, Spiegelman, Jeffrey, Benham, Marshall, Kim, Si Joon, Choi, Rino, Kim, Jiyoung

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Low temperature thermal ALD TaNx and TiNx films from anhydrous N2H4 von Wolf, Steven, Breeden, Michael, Kwak, Iljo, Park, Jun H., Kavrik, Mahmut, Naik, Mehul, Alvarez, Daniel, Spiegelman, Jeffrey, Kummel, Andrew C.

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Robust low-temperature (350 °C) ferroelectric Hf0.5Zr0.5O2 fabricated using anhydrous H2O2 as the ALD oxidant von Jung, Yong Chan, Kim, Jin-Hyun, Hernandez-Arriaga, Heber, Mohan, Jaidah, Hwang, Su Min, Le, Dan N., Sahota, Akshay, Kim, Harrison Sejoon, Kim, Kihyun, Choi, Rino, Nam, Chang-Yong, Alvarez, Daniel, Spiegelman, Jeffrey, Kim, Si Joon, Kim, Jiyoung

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Low-Resistivity Titanium Nitride Thin Films Fabricated by Atomic Layer Deposition with TiCl 4 and Metal–Organic Precursors in Horizontal Vias von Kuo, Cheng-Hsuan, Mcleod, Aaron J., Lee, Ping-Che, Huang, James, Kashyap, Harshil, Wang, Victor, Yun, SeongUK, Zhang, Zichen, Spiegelman, Jeffrey, Kanjolia, Ravindra, Moinpour, Mansour, Kummel, Andrew C.

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Low-Resistivity Titanium Nitride Thin Films Fabricated by Atomic Layer Deposition with TiCl4 and Metal–Organic Precursors in Horizontal Vias von Kuo, Cheng-Hsuan, Mcleod, Aaron J., Lee, Ping-Che, Huang, James, Kashyap, Harshil, Wang, Victor, Yun, SeongUK, Zhang, Zichen, Spiegelman, Jeffrey, Kanjolia, Ravindra, Moinpour, Mansour, Kummel, Andrew C.

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Ultra-High Purity Hydrazine Delivery for Low Temperature Metal Nitride ALD von Alvarez, Daniel, Spiegelman, Jeffrey, Holmes, Russell, Andachi, Keisuke, Raynor, Mark, Shimizu, Hank

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Novel Oxidants and Sources of Nitrogen for Atomic Layer Deposition von Alvarez, Daniel, Spiegelman, Jeffrey, Heinlein, Ed, Holmes, Russell, Ramos, Chris, Leo, Mark, Webb, Sean

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Hydrogen peroxide plasma etch of ashable hard mask von Spiegelman, Jeffrey J

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Improved uniformity for thin oxides when using wet thermal oxidation von Alvarez, Dan, Spiegelman, J.

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HYDROGEN PEROXIDE PLASMA ETCH OF ASHABLE HARD MASK von SPIEGELMAN, Jeffrey J

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HYDROGEN PEROXIDE PLASMA ETCH OF ASHABLE HARD MASK von Spiegelman, Jeffrey J

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GAS RECOVERY SYSTEMS AND METHODS von SPIEGELMAN, Jeffrey J

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GAS RECOVERY SYSTEMS AND METHODS von Spiegelman, Jeffrey J

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SUPPRESSION OF HYDROGEN DEGRADATION von ALVAREZ, Daniel Jr, SPIEGELMAN, Jeffrey J

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Controlled vapor delivery into low pressure processes von Spiegelman, Jeffrey J, Shamsi, Zohreh

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Water vapor delivery for CIGSe and other thin film vacuum processes von Spiegelman, J, Boumsellek, S

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