Electric characterization of transition metal (Co, Ni, Fe) doped ZnO thin layers prepared by atomic layer deposition von Spassov, D, Paskaleva, A, Blagoev, B, Mehandzhiev, V

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Interfaces in ALD very thin Al2O3/HfO2 stacks studied by ellipsometry von Karmakov, Y, Paskaleva, A, Spassov, D

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Charge trapping effects in nonvolatile memory cells with HfO2/Al2O3 nanolaminated trapping layer von Spassov, D, Paskaleva, A, Guziewicz, E, Stanchev, T, Ivanov, Tz

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Electric, dielectric and optical properties of Ga2O3 grown by metal organic chemical vapour deposition von Paskaleva, A, Spassov, D, Terziyska, P

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A comparative study of charge trapping in HfO2/Al2O3 and ZrO2/Al2O3 based multilayered metal/high-k/oxide/Si structures von Spassov, D., Skeparovski, A., Paskaleva, A., Novkovski, N.

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Hole and electron trapping in HfO2/Al2O3 nanolaminated stacks for emerging non-volatile flash memories von Spassov, D, Paskaleva, A, Krajewski, T A, Guziewicz, E, Luka, G

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Leakage currents in Al2O3/HfO2 multilayer high-k stacks and their modification by post-deposition annealing steps von Spassov, D, Paskaleva, A, Krajewski, T A, Guziewicz, E, Ivanov, Tz

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Effect of oxygen concentration and metal electrode on the resistive switching in MIM capacitors with transition metal oxides von Spassov, D, Paskaleva, A, Fröhlich, K, Ivanov, Tz

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A tumor-suppressing function in the epithelial adhesion protein Trask von Spassov, D S, Wong, C H, Harris, G, McDonough, S, Phojanakong, P, Wang, D, Hann, B, Bazarov, A V, Yaswen, P, Khanafshar, E, Moasser, M M

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Electrical characteristics of multilayered HfO2-Al2O3 charge trapping stacks deposited by ALD von Spassov, D, Paskaleva, A, Guziewicz, E, Luka, G, AKrajewski, T, Kopalko, K, Wierzbicka, A, Blagoev, B

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Nanomechanical properties of pure and doped Ta2O5 and the effect of microwave irradiation von Atanassova, E, Lytvyn, P, Dub, S N, Konakova, R V, Mitin, V F, Spassov, D

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High-k HfO2-Ta2O5 mixed layers: Electrical characteristics and mechanisms of conductivity von ATANASSOVA, E, GEORGIEVA, M, SPASSOV, D, PASKALEVA, A

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Doped Ta2O5 and mixed HfO2–Ta2O5 films for dynamic memories applications at the nanoscale von Atanassova, E., Paskaleva, A., Spassov, D.

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X-ray photoelectron spectroscopy of thermal thin Ta2O5 films on Si von Atanassova, E, Spassov, D

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Lightly Al-doped Ta2O5: Electrical properties and mechanisms of conductivity von SPASSOV, D, ATANASSOVA, E, PASKALEVA, A

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Time-dependent-dielectric-breakdown characteristics of Hf-doped Ta2O5/SiO2 stack von Atanassova, E., Novkovski, N., Spassov, D., Paskaleva, A., Skeparovski, A.

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Ellipsometry of very thin Al2O3-HfO2 stacks for nano-memory applications von Karmakov, Y, Spassov, D, Paskaleva, A

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Ellipsometry of very thin Al 2 O 3 -HfO 2 stacks for nano-memory applications von Karmakov, Y, Spassov, D, Paskaleva, A

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Electrical characteristics of Ti-doped Ta2O5 stacked capacitors von ATANASSOVA, E, SPASSOV, D, PASKALEVA, A, GEORGIEVA, M, KOPRINAROVA, J

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Electrical characteristics of Ta2O5 based capacitors with different gate electrodes von SPASSOV, D, ATANASSOVA, E, VIROVSKA, D

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