Pt thermal atomic layer deposition for silicon x-ray micropore optics von Takeuchi, Kazuma, Ezoe, Yuichiro, Ishikawa, Kumi, Numazawa, Masaki, Terada, Masaru, Ishi, Daiki, Fujitani, Maiko, Sowa, Mark J, Ohashi, Takaya, Mitsuda, Kazuhisa

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Role of plasma enhanced atomic layer deposition reactor wall conditions on radical and ion substrate fluxes von Sowa, Mark J.

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Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition von Ishi, Daiki, Ezoe, Yuichiro, Ishikawa, Kumi, Numazawa, Masaki, Fukushima, Aoto, Otsubo, Ryota, Suzuki, Hikaru, Yuasa, Tatsuya, Sakuda, Sae, Uchino, Tomoki, Fujitani, Maiko, Mitsuda, Kazuhisa, Sowa, Mark J.

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Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes von Kazari, Hanie, Pajootan, Elmira, Sowa, Mark, Coulombe, Sylvain, Hubert, Pascal

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Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films von Van Meter, Kylie E., Chowdhury, Md Istiaque, Sowa, Mark J., Kozen, Alexander C., Grejtak, Tomas, Babuska, Tomas F., Strandwitz, Nicholas C., Krick, Brandon A.

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Plasma-enhanced atomic layer deposition of superconducting niobium nitride von Sowa, Mark J., Yemane, Yonas, Zhang, Jinsong, Palmstrom, Johanna C., Ju, Ling, Strandwitz, Nicholas C., Prinz, Fritz B., Provine, J.

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Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions von Chowdhury, Md. Istiaque, Sowa, Mark, Kozen, Alexander C., Krick, Brandon A., Haik, Jewel, Babuska, Tomas F., Strandwitz, Nicholas C.

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Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure von Chowdhury, Md. Istiaque, Sowa, Mark, Van Meter, Kylie E., Babuska, Tomas F., Grejtak, Tomas, Kozen, Alexander C., Krick, Brandon A., Strandwitz, Nicholas C.

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Plasma-enhanced atomic layer deposition of vanadium nitride von Kozen, Alexander C., Sowa, Mark J., Ju, Ling, Strandwitz, Nicholas C., Zeng, Guosong, Babuska, Tomas F., Hsain, Zakaria, Krick, Brandon A.

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Plasma-enhanced atomic layer deposition of titanium vanadium nitride von Sowa, Mark J., Ju, Ling, Kozen, Alexander C., Strandwitz, Nicholas C., Zeng, Guosong, Babuska, Tomas F., Hsain, Zakaria, Krick, Brandon A.

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Plasma-enhanced atomic layer deposition of tungsten nitride von Sowa, Mark J., Yemane, Yonas, Prinz, Fritz B., Provine, J

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METHODS OF FORMING MLD FILMS USING POLYOLS WITH LONG CARBON BACKBONES von SOWA, Mark

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IMPROVED THROUGH SILICON VIA von Sowa Mark

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Pt coating for X-ray optics using plasma atomic layer deposition von Fukushima, Aoto, Ishi, Daiki, Ezoe, Yuichiro, Ishikawa, Kumi, Numazawa, Masaki, Otsubo, Ryota, Suzuki, Hikaru, Yuasa, Tatsuya, Uchino, Tomoki, Sakuda, Sae, Mitsuda, Kazuhisa, Sowa, Mark J.

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IMPROVED THROUGH SILICON VIA von SOWA, MARK

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Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor von Deguns, Eric, Sowa, Mark J., Dalberth, Mark J., Bhatia, Ritwik, Kanjolia, Ravi, Moser, Dan, Sundaram, Ganesh M., Becker, Jill S.

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プラズマ原子層堆積法を用いたX線光学系の Pt 膜付け加工 von 福島, 碧都, 伊師, 大貴, 江副, 祐一郎, 石川, 久美, 沼澤, 正樹, 大坪, 亮太, 鈴木, 光, 湯浅, 辰哉, 内野, 友樹, 作田, 紗恵, 満田, 和久, J., Sowa Mark

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(Invited) Large Format Atomic Layer Deposition von Sundaram, Ganesh M., Bertuch, Adam, Bhatia, Ritwik, Coutu, R., Dalberth, Mark J., Deguns, Eric, Liu, Guo, Sowa, Mark J., Becker, Jill S.

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原子層堆積法によるシリコン X 線微細孔工学系の Pt 膜付け加工 von 武内, 数馬, 江副, 祐一郎, 石川, 久美, 沼澤, 正樹, 寺田, 優, 伊師, 大貴, 藤谷, 麻衣子, 糸山, 隆仁, 大坪, 亮太, 福島, 碧都, J., Sowa Mark, 大橋, 隆哉, 満田, 和久

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Methods of Forming MLD Films Using Polyols With Long Carbon Backbones von Sowa, Mark J

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