Reducing virtual source size by using facetless electron source for high brightness von Matsunaga, Soichiro, Sohda, Yasunari

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Impact of secondary electron emission noise in SEM von Sakakibara, Makoto, Suzuki, Makoto, Tanimoto, Kenji, Sohda, Yasunari, Bizen, Daisuke, Nakamae, Koji

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Study on Image Drift Induced by Charging during Observation by Scanning Electron Microscope von Okai, Nobuhiro, Sohda, Yasunari

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Acceptance characterization of electron detector in SEM using stainless steel sphere von Sekiguchi, Takashi, Yao, Yuanzhao, Sonoda, Ryosuke, Sohda, Yasunari

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Charge Modeling for Metal Layer on Insulating Substrate von Okai, Nobuhiro, Yano, Tasuku, Sohda, Yasunari

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Simulation of electron scattering in a scanning electron microscope for subsurface metrology von Okai, Nobuhiro, Sohda, Yasunari

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Simulation of Limited-Area Cathode as Mask-Irradiation Source von Sohda, Yasunari, Tanimoto, Sayaka, Ohta, Hiroya

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Study on Image Drift Induced by Charging during Observation by Scanning Electron Microscope von Okai, Nobuhiro, Sohda, Yasunari

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Charge Modeling for Metal Layer on Insulating Substrate von Okai, Nobuhiro, Yano, Tasuku, Sohda, Yasunari

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Carbon- coating of facetless electron source for increasing beam brightness von Matsunaga, Soichiro, Sohda, Yasunari

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Preparatory Study for the Matrix-Pattern Imaging, EB System von Tanimoto, Sayaka, Someda, Yasuhiro, Okumura, Masahide, Ohta, Hiroya, Sohda, Yasunari, Saitou, Norio

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Design and Evaluation of an Electron Objective Lens System with Two Lenses and Two Deflectors von Ohta, Hiroya, Sohda, Yasunari, Saitou, Norio

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Dynamic blanking control of single column multi-electron-beam system von Kamimura, Osamu, Ohta, Hiroya, Tanimoto, Sayaka, Sakakibara, Makoto, Nakayama, Yoshinori, Sohda, Yasunari, Muraki, Masato, Gotoh, Susumu, Hosoda, Masaki, Someda, Yasuhiro, Tamamori, Kenji, Hirose, Futoshi, Nagae, Kenichi, Kato, Kazuhiko, Seto, Isamu, Kuwabara, Masamichi, Okunuki, Masahiko

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Polymer dissolution characteristics of radiation-induced grafted resist in X-ray lithography von OIZUMI, H, SOHDA, Y, MOCHIJI, K

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Study of Measurement Condition Optimization in Critical Dimension-Scanning Electron Microscope von Hitomi, Keiichiro, Nakayama, Yoshinori, Yamanashi, Hiromasa, Sohda, Yasunari, Kawada, Hiroki

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Measurements of Variable-Shaped Electron Beams with Solid-State Detector and Scattering Aperture von Sakakibara, Makoto, Ohta, Hiroya, Kanosue, Tadashi, Sohda, Yasunari, Ban, Naoma

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Coulomb blur in a multi-electron-beam system von Sohda, Yasunari, Kamimura, Osamu, Ohta, Hiroya

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Cell projection lithography with scattering contrast von SOHDA, Y, SOMEDA, Y, SATOH, H, NAKAYAMA, Y, SAITOU, N, ITOH, H

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Calibration sample, electron beam adjustment method and electron beam apparatus using same von Bizen, Kaori, Ohta, Hiroya, Sohda, Yasunari, Abe, Yusuke, Nakayama, Yoshinori

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Electron beam device von Bizen, Daisuke, Sakakibara, Makoto, Sohda, Yasunari

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