Using Mental Imagery to Improve Memory in Patients With Alzheimer Disease: Trouble Generating or Remembering the Mind's Eye? von HUSSEY, Erin P, SMOLINSKY, John G, PIRYATINSKY, Irene, BUDSON, Andrew E, ALLY, Brandon A

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Hot-carrier aging of the MOS transistor in the presence of spin-on glass as the interlevel dielectric von Lifshitz, N., Smolinsky, G.

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Preparation and characterization of functionalized polyethylene surfaces von Nuzzo, R. G, Smolinsky, G

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Water‐Related Charge Motion in Dielectrics von Lifshitz, N., Smolinsky, G.

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The plasma oxidation of CF4 in a tubular-alumina fast-flow reactor von Smolinsky, G., Flamm, D. L.

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Detection of water-related charge in electronic dielectrics von LIFSHITZ, N, SMOLINSKY, G

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The effect of added hydrogen on the rf discharge chemistry of CF4, CF3H, and C2F6 von Truesdale, E. A., Smolinsky, G.

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Mobile Charge in a Novel Spin‐On Oxide (SOX): Detection of Hydrogen in Dielectrics von Lifshitz, N., Smolinsky, G., Andrews, J. M.

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Oxygen RIE-resistant deep-UV positive resists: poly(trimethylsilylmethyl methacrylate) and poly (trimethylsilylmethyl methacrylate-co-3-oximo-2-butanone methacrylate) von REICHMANIS, E, SMOLINSKY, G

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Using mental imagery to improve memory in patients with Alzheimer's disease: Trouble generating or remembering the mind's eye? von Hussey, Erin, Smolinsky, John G., Piryatinsky, Irene, Budson, Andrew E., Ally, Brandon A.

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Water-related degradation of contacts in the multilevel MOS IC with spin-on glasses as interlevel dielectrics von Lifshitz, N., Lai, W.Y.C., Smolinsky, G.

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Material properties of spin-on silicon oxide (SOX) for fully recessed NMOS field isolation von SMOLINSKY, G, VAIDYA, S, LIFSHITZ, N, KORNBLIT, A, LEBOWITZ, J

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Thin organosilicon films for integrated optics von Tien, P K, Smolinsky, G, Martin, R J

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The effect of added acetylene on the rf discharge chemistry of C2F6. A mechanistic model for fluorocarbon plasmas von Truesdale, E. A., Smolinsky, G., Mayer, T. M.

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The E.P.R. of Ground State Triplet Nitrenes von Smolinsky, G, Wasserman, E, Yager, W. A

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Reactive Ion Etching of Silicon Oxides with Ammonia and Trifluoromethane. The Role of Nitrogen in the Discharge von Smolinsky, G., Truesdale, E. A., Wang, D. N. K., Maydan, D.

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Ionic and neutral species detected by mass spectrometry in a radio-frequency discharge of tetrafluoroethylene von Vasile, M. J, Smolinsky, G

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Ion-etching of discharge-produced tetrafluoroethylene film with hydrogen, oxygen and noble gases. A mass spectrometric analysis von Smolinsky, G., Vasile, M.J.

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Plasma Etching of Silicon and Silicon Dioxide with Hydrogen Fluoride Mixtures von Smolinsky, G., Mayer, T. M., Truesdale, E. A.

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Quintet ground states of m-dicarbene and m-dinitrene compounds von Wasserman, Edel, Murray, Robert Wallace, Yager, William A, Trozzolo, Anthony M, Smolinsky, Gerald

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