Layer formation by resputtering in Ti–Si–C hard coatings during large scale cathodic arc deposition von Eriksson, A.O., Zhu, J.Q., Ghafoor, N., Johansson, M.P., Sjölen, J., Jensen, J., Odén, M., Hultman, L., Rosén, J.

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Structural and mechanical properties of Cr–Al–O–N thin films grown by cathodic arc deposition von Khatibi, A., Sjölen, J., Greczynski, G., Jensen, J., Eklund, P., Hultman, L.

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Arc deposition of Ti–Si–C–N thin films from binary and ternary cathodes — Comparing sources of C von Eriksson, A.O., Ghafoor, N., Jensen, J., Näslund, L.-Å., Johansson, M.P., Sjölen, J., Odén, M., Hultman, L., Rosen, J.

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Mechanical properties and machining performance of Ti1-xAlxN-coated cutting tools von HÖRLING, A, HULTMAN, L, ODEN, M, SJÖLEN, J, KARLSSON, L

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Structural effects of energy input during growth of Ti1−xAlxN (0.55≤x≤0.66) coatings by cathodic arc evaporation von Andersson, J.M., Vetter, J., Müller, J., Sjölén, J.

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Structure and thermal stability of arc evaporated (Ti0.33Al0.67)1-xSixN thin films von FLINK, A, ANDERSSON, J. M, AILING, B, DANIEL, R, SJÖLEN, J, KARLSSON, L, HULTMAN, L

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Structure and mechanical properties of arc evaporated Ti–Al–O–N thin films von Sjölén, J., Karlsson, L., Braun, S., Murdey, R., Hörling, A., Hultman, L.

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Thermal stability, microstructure and mechanical properties of Ti1-xZrxN thin films von HOERLING, A, SJÖLDEN, J, WILLMANN, H, LARSSON, T, ODEN, M, HULTMAN, L

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Thermal stability of arc evaporated high aluminum-content Ti1−xAlxN thin films von Hörling, A., Hultman, L., Odén, M., Sjölén, J., Karlsson, L.

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Influence of Si on the microstructure of arc evaporated (Ti,Si)N thin films; evidence for cubic solid solutions and their thermal stability von Flink, A., Larsson, T., Sjölén, J., Karlsson, L., Hultman, L.

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Microstructural characterization of the tool–chip interface enabled by focused ion beam and analytical electron microscopy von Flink, A., M'Saoubi, R., Giuliani, F., Sjölén, J., Larsson, T., Persson, P.O.Å., Johansson, M.P., Hultman, L.

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Characterization of worn Ti–Si cathodes used for reactive cathodic arc evaporation von Zhu, J. Q., Eriksson, A., Ghafoor, N., Johansson, M. P., Sjölén, J., Hultman, L., Rosén, J., Odén, M.

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Self-organized nanostructures in the Ti–Al–N system von Mayrhofer, Paul H., Hörling, Anders, Karlsson, Lennart, Sjölén, Jacob, Larsson, Tommy, Mitterer, Christian, Hultman, Lars

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Characterization of worn Ti-Si cathodes used for reactive cathodicarc evaporation von Zhu, J. Q., Eriksson, A., Ghafoor, N., Johansson, M. P., Sjölén, J., Hultman, L., Rosén, J., Odén, M.

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Thermal stability, microstructure and mechanical properties of Ti 1 − x Zr x N thin films von Hoerling, A., Sjölén, J., Willmann, H., Larsson, T., Odén, M., Hultman, L.

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Structure and thermal stability of arc evaporated (Ti 0.33Al 0.67) 1 − x Si x N thin films von Flink, A., Andersson, J.M., Alling, B., Daniel, R., Sjölén, J., Karlsson, L., Hultman, L.

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Mechanical properties and machining performance of Ti 1− xAl xN-coated cutting tools von Hörling, A., Hultman, L., Odén, M., Sjölén, J., Karlsson, L.

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Mechanical properties and machining performance of Ti1-x AlxN-coated cutting tools von Hörling, A, Hultman, L., Odén, Magnus, Sjölén, J., Karlsson, L.

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Thermal stability of arc evaporated high aluminum-content Ti sub(1-x)Al sub(x)N thin films von Horling, A, Hultman, L, Oden, M, Sjolen, J, Karlsson, L

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Thermal stability of arc evaporated high aluminum-content Ti 1−x Al x N thin films von Hörling, A., Hultman, L., Odén, M., Sjölén, J., Karlsson, L.

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