Encapsulation of Nanosized Silica by in Situ Polymerization of tert-Butyl Acrylate Monomer von Sondi, Ivan, Fedynyshyn, Theodore H, Sinta, Roger, Matijević, Egon

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“Living” Free-Radical Polymerizations in the Absence of Initiators:  Controlled Autopolymerization von Devonport, Wayne, Michalak, Lora, Malmström, Eva, Mate, Mathew, Kurdi, Bulent, Hawker, Craig J, Barclay, George G, Sinta, Roger

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Fluoroaromatic Resists for 157-nm Lithography von Fedynyshyn, Theodore H., Kunz, Roderick R., Sinta, Roger F., Sworin, Michael, Mowers, William A., Goodman, Russell B., Cabral, Alberto

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Photophysical and photochemical studies of phenothiazine and some derivatives: exploratory studies of novel photosensitizers for photoresist technology von Barra, Monica, Calabrese, Gary S, Allen, Mary Tedd, Redmond, Robert W, Sinta, Roger, Lamola, Angelo A, Small, Richard D, Scaiano, J. C

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Cation and Anion Binding Properties of Poly(vinylbenzoglymes) von Sinta, Roger, Smid, Johannes

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The Development of Chemically Amplified Positive- and Negative-tone Resists for DUV Lithography von Thackeray, James W., Adams, Timothy, Cronin, Michael F., Denison, Mark, Fedynyshyn, Theodore H., Georger, Jacque, Mori, J. Michael, Orsula, George W., Sinta, Roger

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Polymer photochemistry at advanced optical wavelengths von Fedynyshyn, Theodore H., Kunz, Roderick R., Sinta, Roger F., Goodman, Russell B., Doran, Scott P.

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Formation constants of complexes between crown ethers and alkali picrates in apolar solvents. Application of crown ether network polymers von Sinta, Roger, Rose, Peter S, Smid, Johannes

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Photosensitive Material For Lift-Off Applications von Gomes, Gerard, Sinta, Roger, Cronin, Michael, Liu, Sha, Golden, Jeremy

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KRS: An Environmentally Robutst Resist Based on Fast Reaction kinetics von Huang, Wu-Song, Katnani, Ahmad D., Yang, Dominic, Brunsvold, Bill, Bantu, Rao, Khojasteh, Mahmoud, Sooriyakumaran, R., Kwong, Ranee, Lee, Kim Y., Hefferon, George, Orsula, George, Cameron, Jim, Denison, Mark, Sinta, Roger, Thackeray, Jim

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DEEP UV PHOTORESISTS: PHOTOSPEED, RESOLUTION, AND ENVIRONMENTAL STABILITY TRADEOFFS von Thackeray, James W., Adams, Timothy, Fedynyshyn, Theodore H., Georger, Jacque, Hemond, Richard, Medeiros, David, Mori, J. Michael, Orsula, George W., Sinta, Roger F., Small, Richard D.

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Chain Amplified Photoacid Generation from Vicinal Dibromides. A General Strategy for the Efficient Generation of Hydrogen Bromide across the Ultraviolet and Visible Spectrum von Scaiano, J. C, Barra, Mónica, Sinta, Roger

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Strahlungsempfindliche Zusammensetzungen und Verfahren von PAI, DANIEL Y, CALABRESE, GARY, CHEETHAM, KEVIN, RODRIGUEZ STEPHEN S., RODRIGUEZ STEPHEN S, SINTA ROGER F., SINTA ROGER F

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Negative chemically-amplified photoresist and imaging method thereof von Li Haibo, Diao Cuimei, Sun Jia, Sinta Roger, Li Bing, Chen Xin, Han Xiantao

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Dynamics of the Photochemical Debromination of Silicon-Substituted Vicinal Dibromides von Weldon, Dean, Barra, Monica, Sinta, Roger, Scaiano, J. C

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Some Resists Based On Chemically-Amplified Crosslinking Of Phenolic Polymers von Bohland, John F., Calabrese, Gary S., Cronin, Michael F., Canistro, Diane, Fedynyshyn, Theodore H., Ferrari, Joseph, Lamola, A. A., Orsula, George W., Pavelchek, Edward K., Sinta, Roger, Thackeray, James W., Berry, Amanda K., Pogan, Leonard E., Jr, Grandpre, Mark P. de, Feely, Wayne E., Graziano, Karen A., Olsen, Robert, Thompson, Steven, Winkle, Mark R.

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NOVEL PHOTORESIST STRIPPER AND APPLICATION PROCESS THEREOF von LI Haibo, YU Xiaowei, LI Bing, SINTA Roger, CHEN Xin

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NEGATIVE CHEMICALLY-AMPLIFIED PHOTORESIST AND IMAGING METHOD THEREOF von Li Haibo, Diao Cuimei, Sun Jia, Sinta Roger, Li Bing, Chen Xin, Han Xiantao

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SOLDER ALLOYS von SINTA ROGER, RAMIREZ AINISSA GWENETH

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SOLDER ALLOY von ROGER SINTA, RAMIREZ AINISSA G

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