Behavior of downstream plasmas generated in a microwave plasma chemical-vapor deposition reactor von SHUFFLEBOTHAM, P. K, THOMSON, D. J, CARD, H. C

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A review of amorphous silicon alloys: fabrication, properties and applications von SHUFFLEBOTHAM, P. K, CARD, H. C, THANAILAKIS, A

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Investigation of the amorphous-to-microcrystalline transition of hydrogenated silicon films by spectroscopic ellipsometry von HERAK, T. V, SCHELLENBERG, J. J, SHUFFLEBOTHAM, P. K, KAO, K. C

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Amorphous silicon-tellurium alloys von SHUFFLEBOTHAM, P. K, CARD, H. C, KAO, K. C, THANAILAKIS, A

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Silicon from microwave plasmas: Optical properties and their relation to structure von Herak, T.V, Schellenberg, J.J, Shufflebotham, P.K, Kao, K.C, Card, H.C

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Activated reactive evaporation of hydrogenated amorphous silicon nitride von SHUFFLEBOTHAM, P. K, WHITE, J. F, CARD, H. C, KAO, K. C

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Effects of substrate bias on structure and properties of a-Si:H films deposited by ECR microwave plasmas von Herak, T.V., Chau, T.T., Mejia, S.R., Shufflebotham, P.K., Schellenberg, J.J., Card, H.C., Kao, K.C., McLeod, R.D.

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Electrostatic clamping method and apparatus for dielectric workpieces in vacuum processors von M. S. BARNESS, P. K. SHUFFLEBOTHAM

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Electrostatic clamping method and apparatus for dielectric workpieces in vacuum processors von M. S. BARNESS, P. K. SHUFFLEBOTHAM

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Fabrication of a-Si: H films by microwave plasmas under electron cyclotron resonance conditions von Mejia, S.R., McLeod, R.D., Fries, W., Shufflebotham, P., Thomson, D.J., White, J., Shellenberg, J., Kao, K.C., Card, H.C.

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