Angled etching of Si by ClF3-Ar gas cluster injection von Seki, Toshio, Yamamoto, Hiroki, Kozawa, Takahiro, Shojo, Tadashi, Koike, Kunihiko, Aoki, Takaaki, Matsuo, Jiro

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Gas-Solid Reaction Properties of Fluorine Compounds and Solid Adsorbents for Off-Gas Treatment from Semiconductor Facility von Yasui, Shinji, Shojo, Tadashi, Inoue, Goichi, Koike, Kunihiko, Takeuchi, Akihiro, Iwasa, Yoshio

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Analysis of Nanoporous Glass Surface Modified by Silane Coupling Reagents with Double SH Groups and Its In Situ Oxidation Targeting for Novel Proton-conducting Organic–Inorganic Na... von Yazawa, Tetsuo, Shojo, Tadashi, Asahara, Masahiro, Yusa, Shinichi, Mineshige, Atushi, Daiko, Yusuke

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Angled etching of Si by ClF 3 –Ar gas cluster injection von Seki, Toshio, Yamamoto, Hiroki, Kozawa, Takahiro, Shojo, Tadashi, Koike, Kunihiko, Aoki, Takaaki, Matsuo, Jiro

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Angled etching of Si by ClF^sub 3^–Ar gas cluster injection von Seki, Toshio, Yamamoto, Hiroki, Kozawa, Takahiro, Shojo, Tadashi, Koike, Kunihiko, Aoki, Takaaki, Matsuo, Jiro

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Surface structure after etching with ClF3 neutral cluster von Seki, Toshio, Shojo, Tadashi, Koike, Kunihiko, Aoki, Takaaki, Matsuo, Jiro

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Cutting method of workpiece by forming reformed region and dry etching process von Shojo, Tadashi, Senoo, Takehiko, Ogiwara, Takafumi, Izumi, Koichi, Manabe, Toshiki, Sakamoto, Takeshi

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METHOD FOR REMOVING CHLORINE TRIFLUORIDE CLEANING RESIDUES IN SIC EPITAXIAL GROWTH FURNACE SYSTEM von ONO Ryoei, SHOJO Tadashi, MANABE Toshiki

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Cutting method von Shojo, Tadashi, Senoo, Takehiko, Ogiwara, Takafumi, Izumi, Koichi, Manabe, Toshiki, Sakamoto, Takeshi

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GAS CLUSTER PROCESSING DEVICE AND GAS CLUSTER PROCESSING METHOD von KANEHIRA, Keita, YOSHINO, Yu, DOBASHI, Kazuya, SAITO, Yukimasa, KOIKE, Kunihiko, IZUMI, Koichi, ORII, Takehiko, SENOO, Takehiko, SHOJO, Tadashi

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Gas cluster processing device and gas cluster processing method von Saito, Yukimasa, Shojo, Tadashi, Senoo, Takehiko, Orii, Takehiko, Kanehira, Keita, Izumi, Koichi, Dobashi, Kazuya, Koike, Kunihiko, Yoshino, Yu

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CUTTING METHOD von IZUMI, Koichi, SAKAMOTO, Takeshi, MANABE, Toshiki, SENOO, Takehiko, SHOJO, Tadashi, OGIWARA, Takafumi

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CUTTING METHOD von IZUMI, Koichi, SAKAMOTO, Takeshi, MANABE, Toshiki, SENOO, Takehiko, SHOJO, Tadashi, OGIWARA, Takafumi

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Gas Cluster Processing Device and Gas Cluster Processing Method von KANEHIRA, Keita, YOSHINO, Yu, DOBASHI, Kazuya, SAITO, Yukimasa, KOIKE, Kunihiko, IZUMI, Koichi, ORII, Takehiko, SENOO, Takehiko, SHOJO, Tadashi

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CUTTING METHOD von IZUMI, Koichi, SAKAMOTO, Takeshi, MANABE, Toshiki, SENOO, Takehiko, SHOJO, Tadashi, OGIWARA, Takafumi

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CUTTING METHOD von IZUMI, Koichi, SAKAMOTO, Takeshi, MANABE, Toshiki, SENOO, Takehiko, SHOJO, Tadashi, OGIWARA, Takafumi

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백금족 금속의 회수 방법, 백금족 금속 함유막의 제조 방법 및 성막 장치 von SHOJO TADASHI, NAGAYAMA RYOTARO, MANABE TOSHIKI, IZUMI KOICHI

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Method for recovering platinum group metal, method for producing platinum group-containing metal film, and film-forming apparatus von SHOJO TADASHI, MANABE TOSHIKI, NAGAYAMA, RYOTARO, IZUMI KOICHI

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Method for recovering platinum group metal, method for manufacturing film containing platinum group metal, and film-forming apparatus von MANABE, TOSHIKI, SHOJO, TADASHI, NAGAYAMA, RYOTARO, IZUMI, KOICHI

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METHOD FOR RECOVERING PLATINUM GROUP METAL, METHOD FOR MANUFACTURING FILM CONTAINING PLATINUM GROUP METAL, AND FILM-FORMING APPARATUS von NAGAYAMA, Ryotaro, IZUMI, Koichi, MANABE, Toshiki, SHOJO, Tadashi

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