Optical, structural and composition properties of silicon nitride films deposited by reactive radio-frequency sputtering, low pressure and plasma-enhanced chemical vapor deposition von Beliaev, Leonid Yu, Shkondin, Evgeniy, Lavrinenko, Andrei V., Takayama, Osamu

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High aspect ratio titanium nitride trench structures as plasmonic biosensor von Shkondin, E., Repän, T., Takayama, O., Lavrinenko, A. V.

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Optical properties of plasmonic titanium nitride thin films from ultraviolet to mid-infrared wavelengths deposited by pulsed-DC sputtering, thermal and plasma-enhanced atomic layer... von Beliaev, Leonid Yu, Shkondin, Evgeniy, Lavrinenko, Andrei V., Takayama, Osamu

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Understanding the light induced hydrophilicity of metal-oxide thin films von Deshpande, Rucha Anil, Navne, Jesper, Adelmark, Mathias Vadmand, Shkondin, Evgeniy, Crovetto, Andrea, Hansen, Ole, Bachmann, Julien, Taboryski, Rafael

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Corrigendum to: “Optical, structural and composition properties of silicon nitride films deposited by reactive radio-frequency sputtering, low pressure and plasma-enhanced chemical... von Beliaev, Leonid Yu, Shkondin, Evgeniy, Lavrinenko, Andrei V., Takayama, Osamu

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Large-scale high aspect ratio Al-doped ZnO nanopillars arrays as anisotropic metamaterials von Shkondin, E., Takayama, O., Panah, M. E. Aryaee, Liu, P., Larsen, P. V., Mar, M. D., Jensen, F., Lavrinenko, A. V.

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Fabrication of hollow coaxial Al2O3/ZnAl2O4 high aspect ratio freestanding nanotubes based on the Kirkendall effect von Shkondin, Evgeniy, Alimadadi, Hossein, Takayama, Osamu, Jensen, Flemming, Lavrinenko, Andrei V.

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Extreme thermal anisotropy in high-aspect-ratio titanium nitride nanostructures for efficient photothermal heating von Ishii, Satoshi, Higashino, Makoto, Goya, Shinya, Shkondin, Evgeniy, Tanaka, Katsuhisa, Nagao, Tadaaki, Takayama, Osamu, Murai, Shunsuke

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Erratum: “Thickness-dependent optical properties of aluminum nitride films for mid-infrared wavelengths” [J. Vac. Sci. Technol. A 39, 043408 (2021)] von Beliaev, Leonid Yu, Shkondin, Evgeniy, Lavrinenko, Andrei V., Takayama, Osamu

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Thickness-dependent optical properties of aluminum nitride films for mid-infrared wavelengths von Beliaev, Leonid Yu, Shkondin, Evgeniy, Lavrinenko, Andrei V., Takayama, Osamu

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Fabrication of high aspect ratio TiO2 and Al2O3 nanogratings by atomic layer deposition von Shkondin, Evgeniy, Takayama, Osamu, Lindhard, Jonas Michael, Larsen, Pernille Voss, Mar, Mikkel Dysseholm, Jensen, Flemming, Lavrinenko, Andrei V.

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Optical absorption and heat conduction control in high aspect ratio silicon nanostructures for photothermal heating applications von Ishii, Satoshi, Tanjaya, Nicholaus K., Shkondin, Evgeniy, Murai, Shunsuke, Takayama, Osamu

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Midinfrared Surface Waves on a High Aspect Ratio Nanotrench Platform von Takayama, Osamu, Shkondin, Evgeniy, Bodganov, Andrey, Aryaee Panah, M. Esmail, Golenitskii, Kirill, Dmitriev, Pavel, Repän, Taavi, Malureanu, Radu, Belov, Pavel, Jensen, Flemming, Lavrinenko, Andrei V

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Experimental Demonstration of Effective Medium Approximation Breakdown in Deeply Subwavelength All-Dielectric Multilayers von Zhukovsky, Sergei V, Andryieuski, Andrei, Takayama, Osamu, Shkondin, Evgeniy, Malureanu, Radu, Jensen, Flemming, Lavrinenko, Andrei V

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Experimental Observation of Dyakonov Plasmons in the Mid-Infrared von Takayama, O., Dmitriev, P., Shkondin, E., Yermakov, O., Panah, M., Golenitskii, K., Jensen, F., Bogdanov, A., Lavrinenko, A.

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Laguerre-Gauss beam generation in IR and UV by subwavelength surface-relief gratings von Vertchenko, Larissa, Shkondin, Evgeniy, Malureanu, Radu, Monken, Carlos

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Titanium Nitride Nanotrench Metasurfaces for Mid-infrared Chemical Sensing von Beliaev, Leonid Yu, Shkondin, Evgeniy, Lavrinenko, Andrei V., Takayama, Osamu

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Examination of metamaterial solid immersion lenses for subwavelength optical manipulation von Novitsky, Andrey, Repän, T., Malureanu, R., Takayama, O., Shkondin, E., Lavrinenko, A.V.

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Ultrahigh aspect ratio etching of silicon in SF6-O2 plasma: The clear-oxidize-remove-etch (CORE) sequence and chromium mask von Nguyen, Vy Thi Hoang, Shkondin, Evgeniy, Jensen, Flemming, Hübner, Jörg, Leussink, Pele, Jansen, Henri

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Cr and CrOx etching using SF6 and O2 plasma von Hoang Nguyen, Vy Thi, Jensen, Flemming, Hübner, Jörg, Shkondin, Evgeniy, Cork, Roy, Ma, Kechun, Leussink, Pele, De Malsche, Wim, Jansen, Henri

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