Dual Grating Interferometric Lithography for 22-nm Node von Shiotani, Hideaki, Suzuki, Shota, Lee, Dong Gun, Naulleau, Patrick, Fukushima, Yasuyuki, Ohnishi, Ryuji, Watanabe, Takeo, Kinoshita, Hiroo

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Extreme Ultraviolet Resist Development at the University of Hyogo von Watanabe, Takeo, Fukushima, Yasuyuki, Shiotani, Hideaki, Ohnishi, Ryuji, Suzuki, Shota, Kinoshita, Hiroo, Yusa, Shinichi

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CA Resist with Side Chain PAG Group for EUV Resist von Watanabe, Takao, Fukushima, Yasuyuki, Shiotani, Hideaki, Hayakawa, Masamichi, Ogi, Satoshi, Enodo, Yusuke, Yamamoto, Tomotaka, Yusa, Shinichi, Kinoshita, Hiroo

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Mitigation of Low LER with PAG Bonded Resist for EUVL von Fukushima, Yasuyuki, Watanabe, Takeo, Ohnishi, Ryuji, Kinoshita, Hiroo, Shiotani, Hideaki, Suzuki, Shouta, Hayakawa, Masamichi, Endo, Yusuke, Yamanaka, Tomotaka, Yusaa, Shinichi

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Optimization of Photoacid Generator in Photoacid Generation-Bonded Resist von Fukushima, Yasuyuki, Watanabe, Takeo, Ohnishi, Ryuji, Shiotani, Hideaki, Suzuki, Shota, Hayakawa, Masamichi, Endo, Yusuke, Yamanaka, Tomotaka, Yusa, Shinichi, Kinoshita, Hiroo

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Beneficial Photoacid Generator for CA Resist in EUVL von Watanabe, Takeo, Hada, Hideo, Fukushima, Yasuyuki, Shiotani, Hideaki, Kinoshita, Hiroo, Komano, Hiroshi

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Development of Low Line Edge Roughness and Highly Sensitive Resist for Extreme Ultraviolet Lithography von Fukushima, Yasuyuki, Watanabe, Takeo, Ohnishi, Ryuji, Shiotani, Hideaki, Suzuki, Shouta, Hayakawa, Masamichi, Ogi, Satoshi, Endo, Yusuke, Yamanaka, Tomotaka, Yusa, Shinichi, Kinoshita, Hiroo

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RADIATION-SENSITIVE COMPOSITION AND PHOTORESIST COMPOSITION von SHIOTANI HIDEAKI, KASHIWAMURA TAKASHI, OWADA TAKANORI, ISHII HIROTOSHI

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RADIATION-SENSITIVE COMPOSITION AND PHOTORESIST COMPOSITION von SHIOTANI HIDEAKI, KASHIWAMURA TAKASHI, OWADA TAKANORI, ISHII HIROTOSHI

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Optimization of photo acid generator in the PAG-bonded resist von Fukkushima, Yasuyuki, Kinoshita, Hiroo, Ohnishi, Ryuji, Watanabe, Takeo, Shiotani, Hideaki, Suzuki, Shouta, Hayakawa, Masamichi, Endo, Yusuke, Yamanaka, Tomotaka, Yusa, Shinichi

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Dual grating interferometric lithography for 22-nm node von Shiotani, Hideaki, Suzuki, Shota, Lee, Dong Gun, Naulleau, Patrick, Watanabe, Takeo, Fukushima, Yasuyuki, Ohnishi, Ryuji, Kinoshita, Hiroo

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COMPOSITION HAVING ACID-LABILE DISSOLUTION INHIBITING GROUP von ISHII, HIROTOSHI, KASHIWAMURA, TAKASHI, SHIOTANI, HIDEAKI, OWADA, TAKANORI

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CYCLIC COMPOUND, PHOTORESIST BASE MATERIAL, AND PHOTORESIST COMPOSITION von YOMOGITA, AKINORI, KASHIWAMURA, TAKASHI, SHIOTANI, HIDEAKI, OWADA, TAKANORI

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CYCLIC COMPOUNDS AND PHOTORESIST COMPOSITIONS USING SAME von AOYAMA, KAYOKO, ISHII, HIROTOSHI, KASHIWAMURA, TAKASHI, SHIOTANI, HIDEAKI, OWADA, TAKANORI

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STEREOISOMERIC CYCLIC COMPOUNDS, MANUFACTURING METHOD THEREFOR, COMPOSITIONS COMPRISING THE STEREOISOMERIC CYCLIC COMPOUNDS AND MANUFACTURING METHOD THEREFOR von ISHII, HIROTOSHI, YOMOGITA, AKINORI, KASHIWAMURA, TAKASHI, SHIOTANI, HIDEAKI, OWADA, TAKANORI

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Communication apparatus, communication method, and record medium von SHIOTANI, HIDEAKI, NAMIOKA, YASUO, IIDA, HARUHIKO, NAKAMURA, HITOYA, TANAKA, TAKESHI, KAGAYA, AKIRA, SEKI, TOSHIBUMI, HASHIMOTO, KEISUKE, KATAOKA, YOSHIO

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An apparatus for supporting parallelization von HANDA KEIICHI, HONIDEN SHINICHI, SHIOTANI HIDEAKI, OHSUGA AKIHIKO, SEKI TOSHIBUMI, NAGAI YASUO, TAHARA YASUYUKI, ITO SATOSHI, SAWASHIMA NOBUYUKI, UCHIHIRA NAOSHI

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Programming method for concurrent programs and program supporting apparatus thereof von Uchihira, Naoshi, Honiden, Shinichi, Ohsuga, Akihiko, Seki, Toshibumi, Nagai, Yasuo, Handa, Keiichi, Ito, Satoshi, Sawashima, Nobuyuki, Tahara, Yasuyuki, Shiotani, Hideaki

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Programming method for concurrent programs and program supporting apparatus thereof von HANDA KEIICHI, HONIDEN SHINICHI, SHIOTANI HIDEAKI, OHSUGA AKIHIKO, SEKI TOSHIBUMI, NAGAI YASUO, TAHARA YASUYUKI, ITO SATOSHI, SAWASHIMA NOBUYUKI, UCHIHIRA NAOSHI

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PRECURSOR FOR ACID-DISSOCIABLE DISSOLUTION-INHIBITIVE GROUP AND CYCLIC COMPOUND HAVING ACID-DISSOCIABLE DISSOLUTION-INHIBITIVE GROUP von ISHII, HIROTOSHI, YOMOGITA, AKINORI, KASHIWAMURA, TAKASHI, SHIOTANI, HIDEAKI, SEKIKAWA, MASASHI, OWADA, TAKANORI, SHIBATA, MITSURU

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