Recent Progress of EUV Resist Technology in EIDEC von Shiobara, Eishi

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Recent Progress in EUV Resist Outgas Research at EIDEC von Shiobara, Eishi, Takagi, Isamu, Kikuchi, Yukiko, Sasami, Takeshi, Minegishi, Shinya, Fujimori, Toru, Watanabe, Takeo, Harada, Tetsuo, Kinoshita, Hiroo, Inoue, Soichi

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Development of Tool for Contamination Layer Thickness Measurement Using High Power Extreme Ultraviolet Light and in Situ Ellipsometer von Watanabe, Takeo, Kikuchi, Yukiko, Takahashi, Toshiya, Katayama, Kazuhiro, Takagi, Isamu, Sugie, Norihiko, Tanaka, Hiroyuki, Shiobara, Eishi, Inoue, Soichi, Harada, Tetsuo, Kinoshita, Hiroo

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Comparison of Resist Family Outgassing Characterization between EUV and EB von Takagi, Isamu, Takahashi, Toshiya, Sugie, Norihiko, Katayama, Kazuhiro, Kikuchi, Yukiko, Shiobara, Eishi, Tanaka, Hiroyuki, Inoue, Soichi, Watanabe, Takeo, Harada, Tetsuo, Kinoshita, Hiroo

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Comparison of Resist Outgassing Characterization between High Power EUV and EB von Sugie, Norihiko, Takahashi, Toshiya, Katayama, Kazuhiro, Takagi, Isamu, Kikuchi, Yukiko, Shiobara, Eishi, Tanaka, Hiroyuki, Inoue, Soichi, Watanabe, Takeo, Harada, Tetsuo, Kinoshita, Hiroo

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Comparison of Flow Models for Photoresist Behavior at Contact Holes in Thermal Flow Processes von Eto, Hideo, Miyazaki, Maki, Kondoh, Takehiro, Shiobara, Eishi, Ito, Shinichi, Homma, Tetsuya

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Characterization of Microbridges Generated on Negative Resist Patterns von Keisuke Nakazawa, Keisuke Nakazawa, Eishi Shiobara, Eishi Shiobara, Masafumi Asano, Masafumi Asano, Yasuhiko Sato, Yasuhiko Sato, Satoshi Tanaka, Satoshi Tanaka, Yasunobu Oonishi, Yasunobu Oonishi

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Reflective mask von Shiobara, Eishi

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A New Stacked-Mask Process Utilizing Spun-on Carbon Film for Sub-130-nm Etching von Abe, Junko, Hayashi, Hisataka, Kishigami, Daizo, Sato, Yasuhiko, Shiobara, Eishi, Shibata, Tsuyoshi, Onishi, Yasunobu, Ohiwa, Tokuhisa

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REFLECTIVE MASK von SHIOBARA, Eishi

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Material and Process Development for KrF Lithography using Tri-level Resist Process von Sho, Koutaro, Shiobara, Eishi, Shibata, Tsuyoshi, Nakagawa, Seiji, Kajiwara, Seiji, Matsushita, Takaya, Urayama, Kazuhiko

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Pattern Transfer Process Using Spun-on Carbon Film for KrF and ArF Lithography von Sato, Yasuhiko, Shiobara, Eishi, Matsunaga, Kentaro, Shibata, Tsuyoshi, Abe, Junko, Hayashi, Hisataka, Ohiwa, Tokuhisa, Kasai, Mayumi, Hachiya, Takayo, Onishi, Yasunobu

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Effect of Re-sticking Acid on Resist Profile von Shiobara, Eishi, Kawamura, Daisuke, Matsunaga, Kentaro, Onishi, Yasunobu

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Manufacturing apparatus of semiconductor device and management method of manufacturing apparatus of semiconductor device von Shiobara, Eishi

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Semiconductor device and method of manufacturing the same von Shiobara Eishi

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Application of Organic Silicon Clusters to Pattern Transfer Process for Deep UV Lithography von Sato, Yasuhiko, Shiobara, Eishi, Abe, Junko, Onishi, Yasunobu, Yoshikawa, Sawako, Nakano, Yoshihiko, Hayase, Shuji

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SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME von SHIOBARA Eishi

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MANUFACTURING APPARATUS OF SEMICONDUCTOR DEVICE AND MANAGEMENT METHOD OF MANUFACTURING APPARATUS OF SEMICONDUCTOR DEVICE von SHIOBARA EISHI

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Method for forming pattern von SHIOBARA EISHI

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METHOD FOR FORMING PATTERN von SHIOBARA EISHI

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