Design and Analysis of Metal-Oxide-Semiconductor-Capacitor Microring Optical Modulator With Solid-Phase-Crystallization Poly-Silicon Gate von SHIH, Chih T'sung, ZHI WEI ZENG, SHIUH CHAO

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High-power broad-area InGaNAs/GaAs quantum-well lasers in the 1200 nm range von Yang, Hung-Pin D., Shih, Chih-Tsung, Yang, Su-Mei, Lee, Tsin-Dong

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Solder bonding with a buffer layer for MOEMS packaging using induction heating von HU, Chao-Chang, WEN, Shih-Yi, HSU, Chen-Peng, CHANG, Chun-Wei, SHIH, Chih-Tsung, LEE, Hsiao-Wen

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Simplified numerical method for analyzing TE-like modes in a three-dimensional circularly bent dielectric rib waveguide by solving two one-dimensional eigenvalue equations von CHIH T'SUNG SHIH, CHAO, Shiuh

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Broad-area InGaNAs/GaAs quantum-well lasers in the 1200 nm range von Yang, H.-P.D., Chih-Tsung Shih, Su-Mei Yang, Tsin-Dong Lee

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Creation of second-order nonlinearity and quasi-phase-matched second-harmonic generation in Ge -implanted fused silica planar waveguide von Chen, Huai-Yi, Lin, Chun-Lin, Yang, Yu-Hsien, Chao, Shiuh, Niu, Huan, Shih, Chih T'sung

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Operating method for preventing photomask particulate contamination von Lee, Tsung-Chuan, Chien, Tsung-Chih, Shih, Chih-Tsung, Chen, Jui-Chieh

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METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE von CHANG, Hao-Shiang, LEE, Tsung Chuan, SHIH, Chih-Tsung, CHIEN, Tsung-Chih

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Optical design of bent rib waveguide with MOS cross-section von Shih, Chih T’sung, Zeng, Zhi Wei, Chang, Yin Cheng, Lee, Yao-Jen, Chao, Shiuh

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Reticle enclosure for lithography systems von Chang, Hao-Shiang, Shih, Chih-Tsung, Chien, Tsung-Chih, Lee, Tsung Chuan

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RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS von CHANG, Hao-Shiang, LEE, Tsung Chuan, SHIH, Chih-Tsung, CHIEN, Tsung-Chih

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Reticle enclosure for lithography systems von Chang, Hao-Shiang, Shih, Chih-Tsung, Chien, Tsung-Chih, Lee, Tsung Chuan

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Extreme ultraviolet mask and method of manufacturing the same von Liu, Bo-Tsun, Fu, Shih-Chi, Fu, Chi-Hua, Shih, Chih-Tsung, Chien, Tsung-Chih, Lee, Tsung Chuan, Cheng, Kuotang

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OPERATING METHOD FOR PREVENTING PHOTOMASK PARTICULATE CONTAMINATION von CHEN, Jui-Chieh, SHIH, Chih-Tsung, CHIEN, Tsung-Chih, LEE, Tsung-Chuan

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Semiconductor apparatus and method of operating the same for preventing photomask particulate contamination von Lee, Tsung-Chuan, Chien, Tsung-Chih, Shih, Chih-Tsung, Chen, Jui-Chieh

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RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS von CHANG, Hao-Shiang, LEE, Tsung Chuan, SHIH, Chih-Tsung, CHIEN, Tsung-Chih

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Reticle enclosure for lithography systems von Chang, Hao-Shiang, Shih, Chih-Tsung, Chien, Tsung-Chih, Lee, Tsung Chuan

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Method to reduce native defect printability von Shih, Chih-Tsung, Chien, Tsung-Chih, Lee, Tsung Chuan

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EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME von FU, Shih-Chi, LEE, Tsung Chuan, SHIH, Chih-Tsung, FU, Chi-Hua, CHENG, Kuotang, CHIEN, Tsung-Chih, LIU, Bo-Tsun

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METHOD TO REDUCE NATIVE DEFECT PRINTABILITY von LEE, Tsung Chuan, SHIH, Chih-Tsung, CHIEN, Tsung-Chih

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