Challenges and Progress in Defectivity for Advanced ArF Lithography Process von Tango, Naohiro, Takahashi, Hidenori, Marumo, Kazuhiro, Yamamoto, Kei, O, Keiyu, Shibuya, Akinori, Takada, Akira, Fujita, Mitsuhiro, Fujimori, Toru

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High Sensitive Photopolymerization Initiator System using Violet Laser and Its Application to Photopolymer CTP Plate von Shibuya, Akinori, Kunita, Kazuto, Koizumi, Shigeo

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Palladium/Benzoic Acid Catalyzed Hydroamination of Alkynes von Kadota, Isao, Shibuya, Akinori, Lutete, Leopold Mpaka, Yamamoto, Yoshinori

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High Sensitive Sensitizing Dye by Using Violet Laser ^|^mdash; Its Application to Photopolymer CTP Plate and Industrialization ^|^mdash von Shibuya, Akinori, Kunita, Kazuto

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High Sensitive Sensitizing Dye by Using Violet Laser — Its Application to Photopolymer CTP Plate and Industrialization von Shibuya, Akinori, Kunita, Kazuto

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Palladium/benzoic acid-catalyzed hydroalkoxylation of alkynes von Kadota, Isao, Lutete, Leopold Mpaka, Shibuya, Akinori, Yamamoto, Yoshinori

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Palladium/Acetic Acid Catalyzed Allylation of Some Pronucleophiles with Simple Alkynes von Kadota, Isao, Shibuya, Akinori, Gyoung, Young Soo, Yamamoto, Yoshinori

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Ring Opening in the Palladium-Catalyzed Hydrocarbonation of Methylenecyclopropanes with Pronucleophiles von Tsukada, Naofumi, Shibuya, Akinori, Nakamura, Itaru, Yamamoto, Yoshinori

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Allylation of Carbon Pronucleophiles with Alkynes in the Presence of Palladium/Acetic Acid Catalyst von Patil, Nitin T., Kadota, Isao, Shibuya, Akinori, Gyoung, Young Soo, Yamamoto, Yoshinori

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CURABLE COMPOSITION FOR IMPRINTING, KIT, PATTERN PRODUCING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT von SHIBUYA, Akinori, SHIMOJU, Naoya

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Photosensitive resin composition, heterocyclic ring-containing polymer precursor, cured film, laminate, method for producing cured film, and semiconductor device von Iwai, Yu, Kawabata, Takeshi, Shibuya, Akinori

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METHOD FOR PRODUCING HETEROCYCLE-CONTAINING POLYMER PRECURSOR, HETEROCYCLE-CONTAINING POLYMER PRECURSOR, AND USE FOR SAME von IWAI, Yu, SHIBUYA, Akinori, KAWABATA, Takeshi

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ACTIVE LIGHT-SENSITIVE, OR RADIATION-SENSITIVE RESIN COMPOSITION, AND PATTERN-FORMING METHOD USING SAME von SHIBUYA AKINORI

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Composition for forming adhesive film for imprinting, adhesive film, laminate, method for producing cured product pattern, and method for manufacturing circuit substrate von Shibuya, Akinori, Goto, Yuichiro, Shimoju, Naoya

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Curable composition for imprinting, cured product, pattern forming method, lithography method, pattern, mask for lithography, and polymerizable composition for imprinting von Shibuya, Akinori, Goto, Yuichiro, Shimoju, Naoya

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Photosensitive composition and compound used thereof von SHIBUYA, AKINORI

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POSITIVE RESIST COMPOSITION von YAMAMOTO, Kei, SHIBUYA, Akinori

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Kit, composition for forming underlayer film for imprinting, laminate, and production method using the same von Shibuya, Akinori, Goto, Yuichiro, Hakamata, Akihiro, Shimoju, Naoya

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Composition, adhesive film, laminate, method for producing cured product pattern, and method for manufacturing circuit substrate von Shibuya, Akinori, Goto, Yuichiro, Shimoju, Naoya

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ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION von SHIBUYA AKINORI

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