A novel thermally-stable zirconium amidinate ALD precursor for ZrO2 thin films von LEE, B, CHOI, K. J, SUYDAM, J, HANDE, A, KIM, M. J, WALLACE, R. M, KIM, J, SENZAKI, Y, SHENAI, D, LI, H, ROUSSEAU, M

Volltext

Nucleation and growth study of atomic layer deposited HfO2 gate dielectrics resulting in improved scaling and electron mobility von Kirsch, P. D., Quevedo-Lopez, M. A., Li, H. -J., Senzaki, Y., Peterson, J. J., Song, S. C., Krishnan, S. A., Moumen, N., Barnett, J., Bersuker, G., Hung, P. Y., Lee, B. H., Lafford, T., Wang, Q., Gay, D., Ekerdt, J. G.

Volltext

Effective work function modification of atomic-layer-deposited-TaN film by capping layer von Choi, K., Alshareef, H. N., Wen, H. C., Harris, H., Luan, H., Senzaki, Y., Lysaght, P., Majhi, P., Lee, B. H.

Volltext

Thermal response of Ru electrodes in contact with SiO2 and Hf-based high-k gate dielectrics von Wen, H.-C., Lysaght, P., Alshareef, H. N., Huffman, C., Harris, H. R., Choi, K., Senzaki, Y., Luan, H., Majhi, P., Lee, B. H., Campin, M. J., Foran, B., Lian, G. D., Kwong, D.-L.

Volltext

Evaluation of titanium silicon nitride as gate electrodes for complementary metal-oxide semiconductor von Luan, H., Alshareef, H. N., Harris, H. R., Wen, H. C., Choi, K., Senzaki, Y., Majhi, P., Lee, B.- H.

Volltext

Temperature dependence of the work function of ruthenium-based gate electrodes von Alshareef, H.N., Wen, H.C., Luan, H.F., Choi, K., Harris, H.R., Senzaki, Y., Majhi, P., Lee, B.H., Foran, B., Lian, G.

Volltext

Thermo-coloration of SmS thin flims by XPS in situ observation von Mori, Y, Tanemura, S, Koide, S, Senzaki, Y, Jin, P, Kaneko, K, Terai, A, Nabotova-Gabin, N

Volltext

Evaluation of tantalum silicon alloy systems as gate electrodes von Luan, H., Alshareef, H. N., Lysaght, P. S., Harris, H. R., Wen, H. C., Choi, K., Senzaki, Y., Majhi, P., Lee, B.-H.

Volltext

Atomic layer deposition of hafnium oxide and hafnium silicate thin films using liquid precursors and ozone von Senzaki, Yoshihide, Park, Seung, Chatham, Hood, Bartholomew, Lawrence, Nieveen, Wesley

Volltext

Fabrication and characterization of metal and semiconductor SmS thin films by rf/dc dual magnetron sputtering von Tanemura, S., Koide, S., Senzaki, Y., Miao, L., Hirai, H., Mori, Y., Jin, P., Kaneko, K., Terai, A., Nabatova-Gabain, N.

Volltext

Nucleation and growth study of atomic layer deposited HfO 2 gate dielectrics resulting in improved scaling and electron mobility von Kirsch, P. D., Quevedo-Lopez, M. A., Li, H. -J., Senzaki, Y., Peterson, J. J., Song, S. C., Krishnan, S. A., Moumen, N., Barnett, J., Bersuker, G., Hung, P. Y., Lee, B. H., Lafford, T., Wang, Q., Gay, D., Ekerdt, J. G.

Volltext

Physical Characterization of Novel Metal Electrodes for Hf-based Transistors von Lysaght, P.S., Wen, H.-C., Choi, K., Senzaki, Y., Majhi, P., Alshareef, H., Harris, R., Luan, H., Lian, G., Campin, M., Clark, M., Foran, B., Lee, B.-H.

Volltext

Relationship between Subjective Sleep Quality and Sleep/Arousal State and Activity von K, Kumashiro, Y, Senzaki, K, Uno, R, Takaoka, S, Ishigaki, H, Yatani

Volltext

A new liquid precursor with improved thermal stability for chemical vapor deposition of copper von SENZAKI, Y

Volltext

Evaluation and integration of metal gate electrodes for future generation dual metal CMOS von Majhi, P., Wen, H.C., Alshareef, H., Choi, K., Harris, R., Lysaght, P., Luan, H., Senzaki, Y., Song, S.C., Lee, B.H., Ramiller, C.

Volltext

Development of high-coercivity nanocomposite permanent magnets based on Nd2Fe14B and FexB von Hirosawa, Satoshi, Kanekiyo, Hirokazu, Miyoshi, Toshio, Shigemoto, Yasutaka, Murakami, Kaichi, Senzaki, Yuuka, Nishiuchi, Takashi

Volltext

Batch process for atomic layer deposition of hafnium silicate thin films on 300-mm-diameter silicon substrates von Okuyama, Yoshi, Barelli, Carl, Tousseau, Christopher, Park, Seung, Senzaki, Yoshihide

Volltext

Demonstration of high performance transistors with PVD metal gate von Harris, H.R., Wen, H.C., Choi, K., Alshareef, H., Luan, H., Senzaki, Y., Young, C.D., Song, S.C., Zhang, Z., Bersuker, G., Majhi, P., Lee, B.H.

Volltext

(Invited) Innovative Deposition Technology for Advanced Materials von Baumann, Peter K., Heuken, Michael, Weber, Ulrich, Lehnen, Peer, Senzaki, Yoshi, Lindner, Johannes, Lu, Brian, Karim, Ziaul, Schineller, Bernd

Volltext

A novel thermally-stable zirconium amidinate ALD precursor for ZrO 2 thin films von Lee, B., Choi, K.J., Hande, A., Kim, M.J., Wallace, R.M., Kim, J., Senzaki, Y., Shenai, D., Li, H., Rousseau, M., Suydam, J.

Volltext