Elemental segregation in an AlCoCrFeNi high-entropy alloy – A comparison between selective laser melting and induction melting von Karlsson, Dennis, Marshal, Amalraj, Johansson, Filip, Schuisky, Mikael, Sahlberg, Martin, Schneider, Jochen M., Jansson, Ulf

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Binder jetting of the AlCoCrFeNi alloy von Karlsson, Dennis, Lindwall, Greta, Lundbäck, Andreas, Amnebrink, Mikael, Boström, Magnus, Riekehr, Lars, Schuisky, Mikael, Sahlberg, Martin, Jansson, Ulf

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Atomic layer deposition of aluminum oxide on modified steel substrates von Kukli, Kaupo, Salmi, Emma, Jõgiaas, Taivo, Zabels, Roberts, Schuisky, Mikael, Westlinder, Jörgen, Mizohata, Kenichiro, Ritala, Mikko, Leskelä, Markku

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Ferroelectric Bi4Ti3O12 thin films on Pt-coated silicon by halide chemical vapor deposition von Schuisky, Mikael, Hårsta, Anders, Khartsev, Sergey, Grishin, Alex

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Chemical Vapor Deposition Stability Diagram for the BiI3 ‐  O 2 System von Schuisky, Mikael, Haårsta, Anders

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Atomic layer growth of epitaxial TiO2 thin films from TiCl4 and H2O on α-Al2O3 substrates von AARIK, Jaan, AIDLA, Aleks, MÄNDAR, Hugo, UUSTARE, Teet, SCHUISKY, Mikael, HARSTA, Anders

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Atomic Layer Chemical Vapor Deposition of TiO[sub 2] Low Temperature Epitaxy of Rutile and Anatase von Schuisky, Mikael, Hårsta, Anders, Aidla, Aleks, Kukli, Kaupo, Kiisler, Alma-Asta, Aarik, Jaan

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Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures von Aarik, Jaan, Aidla, Aleks, Mändar, Hugo, Uustare, Teet, Kukli, Kaupo, Schuisky, Mikael

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Atomic layer chemical vapor deposition of TiO2. Low temperature epitaxy of rutile and anatase von SCHUISKY, Mikael, HARSTA, Anders, AIDLA, Aleks, KUKLI, Kaupo, KÜSLER, Alma-Asta, AARIK, Jaan

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Atomic Layer Deposition of Thin Films Using O2 as Oxygen Source von Schuisky, Mikael, Aarik, Jaan, Kukli, Kaupo, Aidla, Aleks, Hårsta, Anders

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Atomic Layer Deposition of Thin Films Using O 2 as Oxygen Source von Schuisky, Mikael, Aarik, Jaan, Kukli, Kaupo, Aidla, Aleks, Hårsta, Anders

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Epitaxial growth of TiO2 films in a hydroxyl-free atomic layer deposition process von SCHUISKY, Mikael, KUKLI, Kaupo, AARIK, Jaan, JUN LU, HARSTA, Anders

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Real-Time Monitoring in Atomic Layer Deposition of TiO2 from TiI4 and H2O−H2O2 von Kukli, Kaupo, Aidla, Aleks, Aarik, Jaan, Schuisky, Mikael, Hårsta, Anders, Ritala, Mikko, Leskelä, Markku

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Epitaxial growth of Bi2O2.33 by halide Cvd von Schuisky, Mikael, Hårsta, Anders

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Atomic Layer CVD in the Bi-Ti-O System von Schuisky, M., Kukli, K., Ritala, M., Hårsta, A., Leskelä, M.

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Atomic Layer Deposition of Titanium Oxide from TiI4 and H2O2 von Kukli, K., Ritala, M., Schuisky, M., Leskelä, M., Sajavaara, T., Keinonen, J., Uustare, T., Hårsta, A.

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Halide Chemical Vapor Deposition of Bi 4 Ti 3 O 12 von Schuisky, Mikael, Hårsta, Anders

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Halide Chemical Vapor Deposition of Bi4Ti3O12 von Schuisky, Mikael, Hårsta, Anders

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Epitaxial growth of TiO 2 films in a hydroxyl-free atomic layer deposition process von Schuisky, Mikael, Kukli, Kaupo, Aarik, Jaan, Lu, Jun, Hårsta, Anders

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Binder jetting of the AlCoCrFeNi alloy von Karlsson, Dennis, Lindwall, Greta, Lundback, Andreas, Amnebrink, Mikael, Bostrom, Magnus, Riekehr, Lars, Schuisky, Mikael, Sahlberg, Martin, Jansson, Ulf

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