Incipient Ferroelectricity in Al-Doped HfO2 Thin Films von Mueller, Stefan, Mueller, Johannes, Singh, Aarti, Riedel, Stefan, Sundqvist, Jonas, Schroeder, Uwe, Mikolajick, Thomas

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Complex Internal Bias Fields in Ferroelectric Hafnium Oxide von Schenk, Tony, Hoffmann, Michael, Ocker, Johannes, Pešić, Milan, Mikolajick, Thomas, Schroeder, Uwe

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Direct Observation of Negative Capacitance in Polycrystalline Ferroelectric HfO2 von Hoffmann, Michael, Pešić, Milan, Chatterjee, Korok, Khan, Asif I., Salahuddin, Sayeef, Slesazeck, Stefan, Schroeder, Uwe, Mikolajick, Thomas

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Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films von Park, Min Hyuk, Lee, Young Hwan, Kim, Han Joon, Kim, Yu Jin, Moon, Taehwan, Kim, Keum Do, Müller, Johannes, Kersch, Alfred, Schroeder, Uwe, Mikolajick, Thomas, Hwang, Cheol Seong

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Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment von Park, Min Hyuk, Lee, Young Hwan, Kim, Han Joon, Schenk, Tony, Lee, Woongkyu, Kim, Keum Do, Fengler, Franz P G, Mikolajick, Thomas, Schroeder, Uwe, Hwang, Cheol Seong

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Improved Ferroelectric Switching Endurance of La-Doped Hf0.5Zr0.5O2 Thin Films von Chernikova, Anna G, Kozodaev, Maxim G, Negrov, Dmitry V, Korostylev, Evgeny V, Park, Min Hyuk, Schroeder, Uwe, Hwang, Cheol Seong, Markeev, Andrey M

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Switching Kinetics in Nanoscale Hafnium Oxide Based Ferroelectric Field-Effect Transistors von Mulaosmanovic, Halid, Ocker, Johannes, Müller, Stefan, Schroeder, Uwe, Müller, Johannes, Polakowski, Patrick, Flachowsky, Stefan, van Bentum, Ralf, Mikolajick, Thomas, Slesazeck, Stefan

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Thermodynamic and Kinetic Origins of Ferroelectricity in Fluorite Structure Oxides von Park, Min Hyuk, Lee, Young Hwan, Mikolajick, Thomas, Schroeder, Uwe, Hwang, Cheol Seong

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Piezoelectricity in hafnia von Dutta, Sangita, Buragohain, Pratyush, Glinsek, Sebastjan, Richter, Claudia, Aramberri, Hugo, Lu, Haidong, Schroeder, Uwe, Defay, Emmanuel, Gruverman, Alexei, Íñiguez, Jorge

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Ferroelectric negative capacitance domain dynamics von Hoffmann, Michael, Khan, Asif Islam, Serrao, Claudy, Lu, Zhongyuan, Salahuddin, Sayeef, Pešić, Milan, Slesazeck, Stefan, Schroeder, Uwe, Mikolajick, Thomas

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Stabilizing the ferroelectric phase in HfO2-based films sputtered from ceramic targets under ambient oxygen von Mittmann, Terence, Michailow, Michail, Lomenzo, Patrick D., Gaertner, Jan, Falkowski, Max, Kersch, Alfred, Mikolajick, Thomas, Schroeder, Uwe

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Electric Field Cycling Behavior of Ferroelectric Hafnium Oxide von Schenk, Tony, Schroeder, Uwe, Pešić, Milan, Popovici, Mihaela, Pershin, Yuriy V, Mikolajick, Thomas

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Identification of the nature of traps involved in the field cycling of Hf0.5Zr0.5O2-based ferroelectric thin films von Islamov, Damir R., Gritsenko, Vladimir A., Perevalov, Timofey V., Pustovarov, Vladimir A., Orlov, Oleg M., Chernikova, Anna G., Markeev, Andrey M., Slesazeck, Stefan, Schroeder, Uwe, Mikolajick, Thomas, Krasnikov, Gennadiy Ya

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Impact of different dopants on the switching properties of ferroelectric hafniumoxide von Schroeder, Uwe, Yurchuk, Ekaterina, Müller, Johannes, Martin, Dominik, Schenk, Tony, Polakowski, Patrick, Adelmann, Christoph, Popovici, Mihaela I., Kalinin, Sergei V., Mikolajick, Thomas

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Silicon-doped hafnium oxide anti-ferroelectric thin films for energy storage von Ali, Faizan, Liu, Xiaohua, Zhou, Dayu, Yang, Xirui, Xu, Jin, Schenk, Tony, Müller, Johannes, Schroeder, Uwe, Cao, Fei, Dong, Xianlin

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Depolarization as Driving Force in Antiferroelectric Hafnia and Ferroelectric Wake-Up von Lomenzo, Patrick D, Richter, Claudia, Mikolajick, Thomas, Schroeder, Uwe

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Recent progress for obtaining the ferroelectric phase in hafnium oxide based films: impact of oxygen and zirconium von Schroeder, Uwe, Materano, Monica, Mittmann, Terence, Lomenzo, Patrick D., Mikolajick, Thomas, Toriumi, Akira

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Origin of Ferroelectric Phase in Undoped HfO2 Films Deposited by Sputtering von Mittmann, Terence, Materano, Monica, Lomenzo, Patrick D., Park, Min Hyuk, Stolichnov, Igor, Cavalieri, Matteo, Zhou, Chuanzhen, Chung, Ching‐Chang, Jones, Jacob L., Szyjka, Thomas, Müller, Martina, Kersch, Alfred, Mikolajick, Thomas, Schroeder, Uwe

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Involvement of Unsaturated Switching in the Endurance Cycling of Si‐doped HfO2 Ferroelectric Thin Films von Li, Shuaidong, Zhou, Dayu, Shi, Zhixin, Hoffmann, Michael, Mikolajick, Thomas, Schroeder, Uwe

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Review of defect chemistry in fluorite-structure ferroelectrics for future electronic devices von Park, Min Hyuk, Lee, Dong Hyun, Yang, Kun, Park, Ju-Yong, Yu, Geun Taek, Park, Hyeon Woo, Materano, Monica, Mittmann, Terence, Lomenzo, Patrick D, Mikolajick, Thomas, Schroeder, Uwe, Hwang, Cheol Seong

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