A new UV sensitive positive resist for X-ray masks manufacture von Voigt, Anja, Heinrich, Marina, Gruetzner, Gabi, Kouba, Josef, Scheunemann, H.-U., Rudolph, I.

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MODULIGA: The LIGA process as a modular production method-current standardization status in Germany von HAHN, L, MEYER, P, BADE, K, HEIN, H, SCHULZ, J, LÖCHEL, B, SCHEUNEMANN, H. U, SCHONDELMAIER, D, SINGLETON, L

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Ultra-high molecular weight polyethylene (UHMW-PE) and its application in microporous separators for lead/acid batteries von Wang, L.C, Harvey, M.K, Ng, J.C, Scheunemann, U

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Alternating Langmuir-Blodgett multilayers with low optical losses for Cerenkov-type frequency doubling von Hickel, W., Menges, B., Althoff, O., Lupo, D., Falk, U., Scheunemann, U.

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Pattern formation and photophysical applications of Langmuir-Blodgett multilayers based on polyglutamates von Mathauer, K., Mathy, A., Bubeck, C., Wegner, G., Hickel, W., Scheunemann, U.

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Negative ion formation in CF2Cl2, CF3Cl and CFCl3 following low energy (0—10 eV) impact with near monoenergetic electrons von Illenberger, E., Scheunemann, H.-U., Baumgärtel, H.

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Evaluation of an advanced submicron X-ray stepper (XRS 200): Pattern transfer and alignment accuracy von Simon, K., Gabeli, F., Rohrmoser, W., Seedorf, S., Scheunemann, H.-U., Huber, H.L.

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Impact of chuck flatness on wafer distortion and stepper overlay - comparison of experimental and FEM-results von Stauch, H., Simon, K., Scheunemann, H.-U., Huber, H.-L.

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Complete x-ray lithography processing of an 8-level 0.4 micron CMOS test device von Staudt-Fischbach, P., Windbracke, W., Bernt, H., Zwicker, G., Friedrich, D., Schliwinski, H.-J., Lange, P., Hemicker, P., Huber, H.-L., Scheunemann, U., Simon, K.

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Microlithography facilities at BESSY von Gerner, M., Kührich, H., Martin, M., Petersen, H., Scheer, M., Wüstefeld, G., Huber, H.-L., Oertel, H.K., Scheunemann, H.-U.

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Application of X-ray steppers using optical alignment for synchrotron-based X-ray lithography von Huber, H., Scheunemann, U., Rohrmoser, W., Cullmann, E.

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Overlay performance of an advanced x-ray stepper (XRS 200) von Gabeli, F., Kucinski, A., Simon, K., Scheunemann, H.-U.

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Photothermal reaction kinetics and thermal desorption of diacetylene langmuir-blodgett films von Laxhuber, L.A., Scheunemann, U., Möhwald, H.

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Photoablative etching of Langmuir-Blodgett films von Magan, J.D., Lemoine, P., Blau, W., Hogan, M., Lupo, D., Prass, W., Scheunemann, U.

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Second-harmonic generation in Langmuir–Blodgett monolayers of stilbazium salt and phenylhydrazone dyes von Lupo, Donald, Laschewsky, Andre, Ledoux, Isabelle, Ringsdorf, Helmut, Prass, Werner, Scheunemann, Ude

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First results in patterning of ultra high aspect ratio microstructures by a 4T wave length shifter at BESSY von Bednarzik, M., Scheunemann, H.-U., Barth, A., Schondelmaier, D., Loechel, B.

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Fabrication of ultra thick, ultra high aspect ratio microcomponents by deep and ultra deep X-ray lithography von Jian, L., Loechel, B., Scheunemann, H.-U., Bednarzik, M., Desta, Y.M., Goettert, J.

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The role of UHMW-PE in microporous PE separators von Wang, L.C., Harvey, M.K., Stein, H.L., Scheunemann, U.

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Langmuir-Blodgett multilayers from polymers for low loss planar waveguides von Hickel, W., Appel, G., Lupo, D., Prass, W., Scheunemann, U.

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Structure and properties of Langmuir-Blodgett films made from polyamides von Lupo, Donald, Prass, Werner, Scheunemann, Ude

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