Feasibility Study of Multiple-Beam Scanning Electron Microscopy for Defect Inspection von Nakasuji, Mamoru, Yoshikawa, Shoji, Satake, Tohru, Noji, Nobuharu

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Epitaxial growth of fcc-Sm/Yb artificial superlattices von MAEDA, A, SATAKE, T, FUJIMORI, T, KURODA, H

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Structural and magnetic studies of an artificial Eu/Mn superlattice von MAEDA, A, SATAKE, T, FUJIMORI, T, TAJIMA, H, KOBAYASHI, M, KURODA, H

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Composition dependence of the physical properties in the superconducting Y-Ba-Cu-O system von TAJIMA, H, MAEDA, A, KOBAYASHI, M, SATAKE, T, SHIMADA, H, MIYAMA, S, KURODA, H

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Characteristics of Cleaning and Carbonizing Plasmas in TEXTOR von Amemiya, Hiroshi, Ishii, Shigeyuki, Oyama, Hitoshi, Sakamoto, Yuichi, Minagawa, Hideki, Satake, Tohru, Hashiba, Masao, Yamashina, Toshiro, Noda, Nobuaki, Hori, Yoichiro, Akaishi, Kenya, Miyahara, Akira, Banno, Tatsuya, Winter, Jörg, Höthker, Klaus, Bieger, Wolfgang

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Large-hole anode-type fast atom beam (LA-FAB) source and its application to high-aspect-ratio GaAs etching von Watanabe, Kenji, Hatakeyama, Masahiro, Ichiki, Katsunori, Satake, Tohru, Kato, Takao, Nagai, Kazutoshi

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Vacuum processing device and vacuum processing method von SATAKE TOHRU

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METHOD OF CONTROLLING ELECTRON BEAM FOCUSING OF PIERCE TYPE ELECTRON GUN AND CONTROL DEVICE THEREFOR von SHEN, GUO HUA, IIJIMA, EIICHI, SATAKE, TOHRU

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A Simple Ion Energy Analyser Equipped with a Quadrupole Mass Spectrometer von Satake, Tohru, Narusawa, Tadashi, Tsukakoshi, Osamu, Komiya, Souji

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VACUUM PROCESSING DEVICE AND VACUUM PROCESSING METHOD von SATAKE, TOHRU

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UHV-IMMA Development and Application to Hydrogen Detection von Satake, Tohru, Tsukakoshi, Osamu, Shimizu, Akira, Komiya, Souji

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Electro-optical inspection apparatus using electron beam von NAKASUJI MAMORU, NOJI NOBUHARU, SATAKE TOHRU, SOBUKAWA HIROSI

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METHOD OF CONTROLLING ELECTRON BEAM FOCUSING OF PIERCE TYPE ELECTRON GUN AND CONTROL DEVICE THEREFOR von SHEN, GUO HUA, IIJIMA, EIICHI, SATAKE, TOHRU

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Ionenneutralisierungsvorrichtung von HATADA, YOSHIO, TOKYO, JP, SATAKE TOHRU, SATAKE TOHRU, YOMATO-SHI, KANAGAWA-KEN, JP, HAYASHI, HIDEAKI, YOKOHAMA-SHI, KANAGAWA-KEN, JP, NAGAI, KAZUTOSHI, NERIMA-KU, TOKYO, JP

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Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus von NOJI NOBUHARU, SATAKE TOHRU

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Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus von Satake, Tohru, Noji, Nobuharu

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A semiconductor manufacturing apparatus having a built-in inspection apparatus and method therefor von NOJI, NOBUHARU, SATAKE, TOHRU

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METHOD FOR DETECTING A FINE GEOMETRY von NOJI, NOBUHARU, MURAKAMI, TAKESHI, NAGAHAMA, ICHIROTA, HATAKEYAMA, MASAHIRO, YAMAZAKI, YUICHIRO, SATAKE, TOHRU

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Method of controlling electron beam focusing of pierce-type electron gun and control apparatus therefor von Iijima, Eiichi, Shen, Guo Hua, Satake, Tohru

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Method of controlling electron beam focusing of pierce-type electron gun and control apparatus therefor von SHEN GUO HUA, SATAKE TOHRU, IIJIMA EIICHI

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