Simultaneous determination of neutral, anionic and cationic compounds within one chromatographic run using an inductively coupled plasma mass spectrometer as element-specific detec... von Sakai, Tetsushi, Inoue, Yoshinori, Date, Yukiko, Aoyama, Tetsuya, Yoshida, Kaoru, Endo, Ginji

Volltext

Redistribution of in   situ doped or ion-implanted nitrogen in polysilicon von Nakayama, Satoshi, Sakai, Tetsushi

Volltext

Simultaneous determination of chromium(III) and chromium(VI) by ion chromatography with inductively coupled plasma mass spectrometry von Inoue, Yoshinori, Sakai, Tetsushi, Kumagai, Hiroki

Volltext

Evaluation of a Complexation Solid-Phase Extraction Method for Eliminating Interferences Caused by Metal Ions in the Determination of Fluoride Ion in Water von KUMAGAI, Hiroki, TAJIMA, Ikuko, SAKAI, Tetsushi, INOUE, Yoshinori

Volltext

A new silicon-on-insulator structure using a silicon molecular beam epitaxial growth on porous silicon von Konaka, Shinsuke, Tabe, Michiharu, Sakai, Tetsushi

Volltext

High selective determination of bromate in ozonized water by using ion chromatography with postcolumn derivatization equipped with reagent preparation device von Inoue, Yoshinori, Sakai, Tetsushi, Kumagai, Hiroki, Hanaoka, Yuzuru

Volltext

Very Wide-Band Silicon Bipolar Monolithic Amplifiers von Ohara, Mamoru, Kamoto, Tsutomu, Sakai, Tetsushi

Volltext

Retention behavior of methylamines, ethylenediamine and N-methyl-substituted ethylenediamines on a cation-exchange resin having a polycarboxylic acid as the functional group von Kumagai, Hiroki, Shimizu, Naoto, Shimomura, Yoshiko, Sakai, Tetsushi, Inoue, Yoshinori

Volltext

Determination of anions at the ng/1 level by means of switching valves to eliminate the water-dip interference von Kumagai, Hiroki, Sakai, Tetsushi, Matsumoto, Kyouji, Hanaoka, Yuzuru

Volltext

MANUFACTURING METHOD OF SEMICONDUCTOR SUBSTRATE AND OF SEMICONDUCTOR DEVICE von HARA HISAKI, SAKAI TETSUSHI

Volltext bestellen

Semiconductor substrate, semiconductor device and process for producing semiconductor substrate von YAMAZAKI TAKASHI, OHMI SHUNICHIRO, SAKAI TETSUSHI

Volltext bestellen

A 30-ps Si bipolar IC using super self-aligned process technology von Konaka, S., Yamamoto, Y., Sakai, T.

Volltext

CLOSELY SPACED IC CONTACT STRUCTURE AND MANUFACTURE von SAKAI, TETSUSHI

Volltext bestellen

SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD von SAKAI TETSUSHI

Volltext bestellen

SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR DEVICE AND PROCESS FOR PRODUCING SEMICONDUCTOR SUBSTRATE von YAMAZAKI TAKASHI, OHMI SHUNICHIRO, SAKAI TETSUSHI

Volltext bestellen

SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR DEVICE AND PROCESS FOR PRODUCING SEMICONDUCTOR SUBSTRATE von OHMI, SHUNICHIRO, YAMAZAKI, TAKASHI, SAKAI, TETSUSHI

Volltext bestellen

ICP-MS Configuration and Optimization for Successful Routine Analysis of Undiluted Seawater von Sakai, Tetsushi, McCurdy, Ed

Volltext

Subfemtojoule deep submicrometer-gate CMOS built in ultra-thin Si film on SIMOX substrates von Miki, H., Ohmameuda, T., Kumon, M., Asada, K., Sugano, T., Omura, Y., Izumi, K., Sakai, T.

Volltext

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF von YAMADA MASAHIRO, KUROSAWA HIROFUMI, SAKAI TETSUSHI

Volltext bestellen

METHOD FOR OPTIMIZING ION OPTICAL SYSTEM PARAMETER FOR IMPROVING SIGNAL STABILITY AGAINST FLUCTUATION DURING ION BEAM DRAWING PROCESS FROM PLASMA von HIRANO ICHIJI, NAGATA YOICHI, KONDO TAKASHI, SAKAI TETSUSHI

Volltext bestellen