Properties of thin films of tantalum oxide deposited by ion-assisted deposition von Martin, P.J., Bendavid, A., Swain, M., Netterfield, R.P., Kinder, T.J., Sainty, W.G., Drage, D., Wielunski, L.

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Compressive stress induced formation of cubic boron nitride von McKenzie, D.R., McFall, W.D., Sainty, W.G., Davis, C.A., Collins, R.E.

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New technology for PACVD von McKenzie, D.R., McFall, W.D., Sainty, W.G., Yin, Y., Durandet, A., Boswell, R.W.

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The Microstructure of Boron Nitride Thin Films von Sainty, W.G., McKenzie, David R., Green, D.

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Electron optical techniques for microstructural andcompositional analysis of thin films von McKenzie, David R., Green, D.C., Swift, P.D., Cockayne, D.J.H., Martin, P.J., Netterfield, R.P., Sainty, W.G.

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The structure and properties of ion-beam-synthesized boron nitride films von SAINTY, W.G, MARTIN, P. J, NETTERFIELD, R. P, MCKENZIE, D. R, COCKAYNE, D. J. H, DWARTE, D. M

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Optical properties of thin amorphous silicon and amorphous hydrogenated silicon films produced by ion beam techniques von Martin, P.J., Netterfield, R.P., Sainty, W.G., McKenzie, D.R.

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Spectrally selective PbS films produced by ion beam sputtering von Martin, P.J., Netterfield, R.P., Sainty, W.G.

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Oxygen-ion-assisted deposition of thin gold films von Martin, P.J., Sainty, W.G., Netterfield, R.P., Buckley, A.N.

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