Unusual behaviour of current-voltage relations in an unbalanced grid-assisted magnetron sputtering system von Sagás, J C, Duarte, D A, Fontana, L C

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The effects of plasma nitriding pretreatment in steel substrates on the photocatalytic activity of TiO2 films von Irala, D.R., Fontana, L.C., Sagás, J.C., Maciel, H.S.

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Modeling reactive sputter deposition of titanium nitride in a triode magnetron sputtering system von Sagás, J.C., Duarte, D.A., Irala, D.R., Fontana, L.C., Rosa, T.R.

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Effect of nitrogen content in amorphous SiCxNyOz thin films deposited by low temperature reactive magnetron co-sputtering technique von Medeiros, H.S., Pessoa, R.S., Sagás, J.C., Fraga, M.A., Santos, L.V., Maciel, H.S., Massi, M., Sobrinho, A.S. da Silva, da Costa, M.E.H. Maia

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Modeling the reactive sputter deposition of N-doped TiO2 for application in dye-sensitized solar cells: Effect of the O2 flow rate on the substitutional N concentration von Duarte, D.A., Sagás, J.C., da Silva Sobrinho, A.S., Massi, M.

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Morphology of Al Thin Films Deposited Under Different Magnetic Field Configurations by Grid-assisted Magnetron Sputtering von Duarte, D. A., Sagás, J. C., Grigorov, K.

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Hysteresis-free deposition of TiOxNy thin films: Effect of the reactive gas mixture and oxidation of the TiN layers on process control von Duarte, D.A., Massi, M., Sagás, J.C., da Silva Sobrinho, A.S., Irala, D.R., Fontana, L.C.

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Influence of electromagnetic confinement on the characteristics of a triode magnetron sputtering system von Sagás, J.C., Fontana, L.C., Maciel, H.S.

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Effect of oxygen concentration and system geometry on the current–voltage relations during reactive sputter deposition of titanium dioxide thin films von Sagás, J.C., Duarte, D.A., Fissmer, S.F.

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Corrosion resistance of functionally graded TiN/Ti coatings for proton exchange membrane fuel cells von Silva, F.C., Prada Ramirez, O.M., Tunes, M.A., Edmondson, P.D., Sagás, J.C., Fontana, L.C., de Melo, H.G., Schön, C.G.

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Effects of plasma assisted combustion on pollutant emissions of a premixed flame of natural gas and air von Varella, R.A., Sagás, J.C., Martins, C.A.

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TiO2 nanoparticle deposition on cotton fabric through pulsed electrical current in water/TiO2 solution von dos Santos, V. F., Fontana, L. C., Sagás, J. C., Missner, M. E. P., Becker, D.

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Effects of non-steady state discharge plasma on natural gas combustion: Flammability limits, flame behavior and hydrogen production von Sagás, J.C., Maciel, H.S., Lacava, P.T.

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Repetition frequency of a DC gliding arc discharge in plasma-assisted fuel-rich combustion von Pinto, A. J., Sagás, J. C., Lacava, P. T.

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Control of the substrate temperature using a triode magnetron sputtering system von Duarte, D. A., Sagás, J. C., Fontana, L. C., da Silva Sobrinho, A. S., Cinelli, M. J.

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Ni/Al2O3 spherical catalysts produced by magnetron sputtering von dos Santos, A.M., Sagás, J.C., Pereira, A.L.J., Origo, F.D., Catapan, R.C., Duarte, D.A.

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Structural, morphological, and optical properties of TiO2 thin films grown by atomic layer deposition on fluorine doped tin oxide conductive glass von Chiappim, W., Testoni, G.E., Moraes, R.S., Pessoa, R.S., Sagás, J.C., Origo, F.D., Vieira, L., Maciel, H.S.

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The Role of HiPIMS Pulse Length in Reactive Deposition of Transparent Conductive Oxide Nb:TiO2 Films von Stryhalski, J., Laur, A., Sagás, J.C., Couto, A.A, Grigorov, K., Fontana, L.C., Massi, M.

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Grid-assisted magnetron sputtering deposition of nitrogen graded TiN thin films von da Silva, F. C., Tunes, M. A., Edmondson, P. D., Lima, N. B., Sagás, J. C., Fontana, L. C., Schön, C. G.

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Experimental Studies on Low-Pressure Plane-Parallel Hollow Cathode Discharges von Pessoa, R. S., Sagás, J. C., Rodrigues, B. V. M., Galvão, N. K. A. M., Fraga, M. A., Petraconi, G., Maciel, H.S.

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