Internal gettering for Ni contamination in Czochralski silicon wafers von SUEOKA, K, SADAMITSU, S, KOIKE, Y, KIHARA, T, KATAHAMA, H

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Dependence of the Grown-in Defect Distribution on Growth Rates in Czochralski Silicon von Sadamitsu, Shinsuke, Umeno, Shigeru, Koike, Yasuo, Hourai, Masataka, Shigeo Sumita, Shigeo Sumita, Tatsuhiko Shigematsu, Tatsuhiko Shigematsu

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Analysis of local lattice strains around plate-like oxygen precipitates in Czochralski-silicon wafers by convergent-beam electron diffraction von OKUYAMA, T, NAKAYAMA, M, SADAMITSU, S, NAKSHIMA, J, TOMOKIYO, Y

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Axial microscopic distribution of grown-in defects in Czochralski-grown silicon crystals von UMENO, S, SADAMITSU, S, MURAKAMI, H, HOURAI, M, SUMITA, S, SHIGEMATSU, T

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Gettering characteristics of heavy metal impurities in silicon wafers with polysilicon back seal and internal gettering von OGUSHI, S, SADAMITSU, S, MARSDEN, K, KOIKE, Y, SANO, M

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Observation of ring-OSF nuclei in CZ-Si using short-time annealing and infrared light scattering tomography von MARSDEN, K, SADAMITSU, S, HOURAI, M, SUMITA, S, SHIGEMATSU, T

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Degradation of gate oxide integrity by metal impurities von HIRAMOTO, K, SANO, M, SADAMITSU, S, FUJINO, N

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Generation of oxidation-induced stacking faults in Czochralski-grown silicon crystals exhibiting a ring-like distributed stacking fault region von MARSDEN, K, SADAMITSU, S, YAMAMOTO, T, SHIGEMATSU, T

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A model for the formation of oxidation-induced stacking faults in Czochralski silicon von SADAMITSU, S, OKUI, M, SUEOKA, K, MARSDEN, K, SHIGEMATSU, T

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Effect of Oxide Precipitate Size on Slip Generation in Large Diameter Epitaxial Wafers von Akatsuka, Masanori, Sueoka, Koji, Katahama, Hisashi, Koie, Yasuo, Sadamitsu, Shinsuke

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Transmission electron microscopy observation of defects induced by Fe contamination on Si(100) surface von SADAMITSU, S, SASAKI, A, HOURAI, M, SUMITA, S, FUJINO, N

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TEM observation of defects induced by Cu contamination on Si(100) surface von SADAMITSU, S, SUMITA, S, FUJINO, N, SHIRAIWA, T

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TEM Observation of Defects Induced by Ni Contamination on a Si(100) Surface von Sadamitsu, Shinsuke, Sano, Masakazu, Hourai, Masataka, Sumita, Shigeo, Fujino, Nobukatsu, Shiraiwa, Toshio

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Dependence of Gettering Efficiency on Metal Impurities von Miyazaki, Morimasa, Sano, Masakazu, Sadamitsu, Shinsuke, Sumita, Shigeo, Fujino, Nobukatsu, Shiraiwa, Toshio

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PROCESS FOR PRODUCING SILICON WAFER von Sadamitsu, Shinsuke, Sugimura, Wataru, Hourai, Masataka, Akatsuka, Masanori

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High resistivity silicon wafers von Sadamitsu, Shinsuke, Hourai, Masataka

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High resistivity silicon wafers von SADAMITSU SHINSUKE, HOURAI MASATAKA

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SILICON EPITAXIAL WAFER AND PRODUCTION METHOD FOR SAME von SADAMITSU SHINSUKE, HOURAI MASATAKA

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A METHOD OF MANUFACTURING A HIGH-RESISTANCE SILICON WAFER von TAKAO, HIROYUKI, TAKASE, NOBUMITSU, SUEOKA, KOUJI, HORAI, MASATAKA, SADAMITSU, SHINSUKE

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SILICON INSULATOR SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME von SADAMITSU SHINSUKE

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