Vanadium Electrorefining in NaCl–KCl–VCl 2 Melts von Polovov, Ilya B., Chernyshov, Mikhail V., Volkovich, Vladimir A., Rebrin, Oleg I., Rylov, Alexander N.

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Vanadium Electrorefining in NaCl-KCl-VCl2 Melts von Polovov, Ilya B., Chernyshov, Mikhail V., Volkovich, Vladimir A., Rebrin, Oleg I., Rylov, Alexander N.

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Vanadium Electrorefining in NaCl–KCl–VCl 2 Melts von Polovov, Ilya B., Chernyshov, Mikhail V., Volkovich, Vladimir A., Rebrin, Oleg I., Rylov, Alexander N.

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Distribution of Impurities during Vanadium Electrorefining and Determination of Optimal Conditions of the Process von Polovov, Ilya B., Chernyshov, Mihail V., Volkovich, Vladimir A., Nechkin, Georgiy A., Rebrin, Oleg I., Rylov, Alexander N., Griffiths, Trevor R.

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Distribution of Impurities During Vanadium Electrorefining and Determination of Optimal Conditions of the Process von Polovov, Ilya B., Chernyshov, Mihail V., Volkovich, Vladimir A., Nechkin, Georgiy A., Rebrin, Oleg I., Rylov, Alexander N., Griffiths, Trevor R.

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A 10-Gb/s 5-Tap DFE/4-Tap FFE Transceiver in 90-nm CMOS Technology von Bulzacchelli, J.F., Meghelli, M., Rylov, S.V., Rhee, W., Rylyakov, A.V., Ainspan, H.A., Parker, B.D., Beakes, M.P., Aichin Chung, Beukema, T.J., Pepeljugoski, P.K., Shan, L., Kwark, Y.H., Gowda, S., Friedman, D.J.

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Constant Curvature Connections On Statistical Models von Rylov, Alexander

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Designing Adaptive Online Mathematics Course Based on Individualization Learning von Konnova, Larisa, Lipagina, Larisa, Postovalova, Galina, Rylov, Alexander, Stepanyan, Irina

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Classification of Neuron Type Based on Average Activity von Rylov, Alexander, Levanova, Tatiana, Stasenko, Sergey

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A 25 Gb/s Burst-Mode Receiver for Low Latency Photonic Switch Networks von Rylyakov, Alexander, Proesel, Jonathan E., Rylov, Sergey, Lee, Benjamin G., Bulzacchelli, John F., Ardey, Abhijeet, Parker, Ben, Beakes, Michael, Baks, Christian W., Schow, Clint L., Meghelli, Mounir

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A fast consistent grid-based clustering algorithm von Tarasenko, Anton S., Berikov, Vladimir B., Pestunov, Igor A., Rylov, Sergey A., Ruzankin, Pavel S.

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Immersion lithography laser light source with pulse stretcher von FOMENKOV IGOR V, PARTLO WILLIAM N, ERSHOV ALEXANDER I, DANIELEWICZ ED, ARRIOLA EDMOND, FLEUROV VLADIMIR B, BERGSTEDT ROBERT A, CROSBY WALTER, FITZGERALD JOHN, SWAIN ROBIN, JACQUES ROBERT N, RAO RAJASEKHAR M, BROWN DANIEL J.W, SANDSTROM RICHARD L, RYLOV GERMAN, WITTAK CHRISTIAN J, WYATT MIKE

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F2-ZWEIKAMMERLASERSYSTEM MIT LINIENAUSWAHL von MYERS, DAVID, ERSHOV, ALEXANDER, FOMENKOV, IGOR, NESS, RICHARD, HULBURD, WILLIAM, SANDSTROM, RICHARD, PARTLO, WILLIAM N, UJAZDOWSKI, RICHARD, BROWN, DANIEL J.,W, KNOWLES, DAVID S, BESAUCELE, HERVE A, RYLOV, GERMAN E, SMITH, SCOT, ONKELS, ECKEHARD

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RELAX GAS DISCHARGE LASER LITHOGRAPHY LIGHT SOURCE von YAGER, THOMAS, A, SANDSTROM, RICHARD, L, ERSHOV, ALEXANDER I, RAFAC, ROBERT, J, PARTLO, WILLIAM, N, BROWN, DANIEL, J., W, RYLOV, GERMAN, E

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Immersion lithography laser light source with pulse stretcher von Partlo, William N, Ershov, Alexander I, Rylov, German, Fomenkov, Igor V, Brown, Daniel J. W, Wittak, Christian J, Rao, Rajasekhar M, Bergstedt, Robert A, Fitzgerald, John, Sandstrom, Richard L, Fleurov, Vladimir B, Jacques, Robert N, Danielewicz, Ed, Swain, Robin, Arriola, Edward, Wyatt, Michael, Crosby, Walter

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Immersion lithography laser light source with pulse stretcher von FOMENKOV IGOR V, PARTLO WILLIAM N, ERSHOV ALEXANDER I, DANIELEWICZ ED, FLEUROV VLADIMIR B, BERGSTEDT ROBERT A, CROSBY WALTER, FITZGERALD JOHN, SWAIN ROBIN, BROWN DANIEL J. W, JACQUES ROBERT N, RAO RAJASEKHAR M, SANDSTROM RICHARD L, RYLOV GERMAN, WITTAK CHRISTIAN J, ARRIOLA EDWARD, WYATT MICHAEL

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Relax gas discharge laser lithography light source von PARTLO WILLIAM N, ERSHOV ALEXANDER I, BROWN DANIEL J.W, RAFAC ROBERT J, SANDSTROM RICHARD L, RYLOV GERMAN E, YAGER THOMAS A

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RELAX GAS DISCHARGE LASER LITHOGRAPHY LIGHT SOURCE von YAGER, THOMAS, A, SANDSTROM, RICHARD, L, ERSHOV, ALEXANDER I, RAFAC, ROBERT, J, PARTLO, WILLIAM, N, BROWN, DANIEL, J., W, RYLOV, GERMAN, E

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Relax gas discharge laser lithography light source von Sandstrom, Richard L, Partlo, William N, Brown, Daniel J. W, Yager, Thomas A, Ershov, Alexander I, Rafac, Robert J, Rylov, German E

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Relax gas discharge laser lithography light source von PARTLO WILLIAM N, ERSHOV ALEXANDER I, RAFAC ROBERT J, SANDSTROM RICHARD L, RYLOV GERMAN E, BROWN DANIEL J. W, YAGER THOMAS A

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