Growth of Plasma-Treated Corn Seeds under Realistic Conditions von Ahn, Chisung, Gill, John, Ruzic, David N.

Volltext

High power pulsed magnetron sputtering: A method to increase deposition rate von Raman, Priya, Shchelkanov, Ivan A., McLain, Jake, Ruzic, David N

Volltext

Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching von Elg, Daniel T., Panici, Gianluca A., Liu, Sumeng, Girolami, Gregory, Srivastava, Shailendra N., Ruzic, David N.

Volltext

Liquid lithium surface control and its effect on plasma performance in the HT-7 tokamak von Zuo, G.Z., Ren, J., Hu, J.S., Sun, Z., Yang, Q.X., Li, J.G., Zakharov, L.E., Ruzic, David N.

Volltext

F-TRIDYN: A Binary Collision Approximation code for simulating ion interactions with rough surfaces von Drobny, Jon, Hayes, Alyssa, Curreli, Davide, Ruzic, David N.

Volltext

Investigation and optimization of the magnetic field configuration in high-power impulse magnetron sputtering von Yu, He, Meng, Liang, Szott, Matthew M, McLain, Jake T, Cho, Tae S, Ruzic, David N

Volltext

Tin removal by an annular surface wave plasma antenna in an extreme ultraviolet lithography source von Qerimi, Dren, Herschberg, Andrew C., Panici, Gianluca, Hays, Parker, Pohlman, Tyler, Ruzic, David N.

Volltext

Time-resolved electron energy distribution functions at the substrate during a HiPIMS discharge with cathode voltage reversal von Huber, Wolfgang, Houlahan, Thomas, Jeckell, Zachary, Barlaz, David, Haehnlein, Ian, Jurczyk, Brian, Ruzic, David N

Volltext

Study of a linear surface wave plasma source for tin removal in an extreme ultraviolet source von Qerimi, Dren, Panici, Gianluca, Jain, Arihant, Jacobson, Daniel, Ruzic, David N.

Volltext

Time-resolved ion energy distribution functions during a HiPIMS discharge with cathode voltage reversal von Jeckell, Zachary, Barlaz, David E, Houlahan, Thomas, Huber, Wolfgang, Haehnlein, Ian, Jurczyk, Brian, Ruzic, David N

Volltext

A high power impulse magnetron sputtering model to explain high deposition rate magnetic field configurations von Raman, Priya, Weberski, Justin, Cheng, Matthew, Shchelkanov, Ivan, Ruzic, David N.

Volltext

Mechanism behind dry etching of Si assisted by pulsed visible laser von Peck, Jason A., Ruzic, David N.

Volltext

High deposition rate nanocrystalline and amorphous silicon thin film production via surface wave plasma source von Peck, Jason A., Zonooz, Piyum, Curreli, Davide, Panici, Gianluca A., Jurczyk, Brian E., Ruzic, David N.

Volltext

Computational studies of thermoelectric MHD driven liquid lithium flow in metal trenches von Xu, Wenyu, Curreli, Davide, Ruzic, David N.

Volltext

Wetting properties of liquid lithium on lithium compounds von Krat, S.A., Popkov, A.S., Gasparyan, Yu. M., Pisarev, A.A., Fiflis, Peter, Szott, Matthew, Christenson, Michael, Kalathiparambil, Kishor, Ruzic, David N.

Volltext

Downstream plasma transport and metal ionization in a high-powered pulsed-plasma magnetron von Meng, Liang, Yu, He, Szott, Matthew M., McLain, Jake T., Ruzic, David N.

Volltext

Correction to: Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching von Elg, Daniel T., Panici, Gianluca A., Liu, Sumeng, Girolami, Gregory, Srivastava, Shailendra N., Ruzic, David N.

Volltext

Plasma-assisted cleaning by metastable-atom neutralization von Lytle, Wayne M., Andruczyk, Daniel, Ruzic, David N.

Volltext

Laboratory Investigation of Vapor Shielding for Lithium-Coated Molybdenum in Devex von Soonwook Jung, Andruczyk, D., Ruzic, D. N.

Volltext

Enhanced effect of a plasma‐irradiated titanium substrate on the photocatalytic activity of a TiO2 film von Zhu, Wei‐Kun, Kalathiparambil, Kishor K., Sun, Zhi‐Guang, Liu, Chen‐Yang, Zhu, Ai‐Min, Ruzic, David N.

Volltext