Tin removal by an annular surface wave plasma antenna in an extreme ultraviolet lithography source von Qerimi, Dren, Herschberg, Andrew C., Panici, Gianluca, Hays, Parker, Pohlman, Tyler, Ruzic, David N.

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Time-resolved electron energy distribution functions at the substrate during a HiPIMS discharge with cathode voltage reversal von Huber, Wolfgang, Houlahan, Thomas, Jeckell, Zachary, Barlaz, David, Haehnlein, Ian, Jurczyk, Brian, Ruzic, David N

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Influence of wettability due to laser-texturing on critical heat flux in vertical flow boiling von Bottini, Joseph L., Kumar, Vineet, Hammouti, Sabrina, Ruzic, David, Brooks, Caleb S.

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A high power impulse magnetron sputtering model to explain high deposition rate magnetic field configurations von Raman, Priya, Weberski, Justin, Cheng, Matthew, Shchelkanov, Ivan, Ruzic, David N.

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High power pulsed magnetron sputtering: A method to increase deposition rate von Raman, Priya, Shchelkanov, Ivan A., McLain, Jake, Ruzic, David N

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High deposition rate nanocrystalline and amorphous silicon thin film production via surface wave plasma source von Peck, Jason A., Zonooz, Piyum, Curreli, Davide, Panici, Gianluca A., Jurczyk, Brian E., Ruzic, David N.

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Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching von Elg, Daniel T., Panici, Gianluca A., Liu, Sumeng, Girolami, Gregory, Srivastava, Shailendra N., Ruzic, David N.

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Liquid lithium surface control and its effect on plasma performance in the HT-7 tokamak von Zuo, G.Z., Ren, J., Hu, J.S., Sun, Z., Yang, Q.X., Li, J.G., Zakharov, L.E., Ruzic, David N.

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High Deposition Rate Symmetric Magnet Pack for High Power Pulsed Magnetron Sputtering von Raman, Priya, Shchelkanov, Ivan, McLain, Jake, Cheng, Matthew, Ruzic, David, Haehnlein, Ian, Jurczyk, Brian, Stubbers, Robert, Armstrong, Sean

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Investigation and optimization of the magnetic field configuration in high-power impulse magnetron sputtering von Yu, He, Meng, Liang, Szott, Matthew M, McLain, Jake T, Cho, Tae S, Ruzic, David N

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Wetting properties of liquid lithium on lithium compounds von Krat, S.A., Popkov, A.S., Gasparyan, Yu. M., Pisarev, A.A., Fiflis, Peter, Szott, Matthew, Christenson, Michael, Kalathiparambil, Kishor, Ruzic, David N.

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Downstream plasma transport and metal ionization in a high-powered pulsed-plasma magnetron von Meng, Liang, Yu, He, Szott, Matthew M., McLain, Jake T., Ruzic, David N.

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Correction to: Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching von Elg, Daniel T., Panici, Gianluca A., Liu, Sumeng, Girolami, Gregory, Srivastava, Shailendra N., Ruzic, David N.

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Sputtering and Thermal Evaporation Studies of Lithiated ATJ Graphite von Ibano, K., Surla, V., Ruzic, D.N.

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Cu films prepared by bipolar pulsed high power impulse magnetron sputtering von Wu, Baohua, Haehnlein, Ian, Shchelkanov, Ivan, McLain, Jake, Patel, Dhruval, Uhlig, Jan, Jurczyk, Brian, Leng, Yongxiang, Ruzic, David N.

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Characterization of elastomer degradation in O2/Ar plasma via mass and surface morphology changes von Connolly, Nicholas, Hysick, Michael, Barlaz, David E., Garza, Raquel, Lunardi, Gilberto, Ruzic, David N.

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Contact angle measurements of liquid lithium on surface-modified stainless steel, insulating materials, and other metals and coatings von Stemmley, Steven, Moore, Braden, Moynihan, Cody, Yang, Oren, Skrecky, Kristin, Ruzic, David

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Ejection of molten tin in the presence of a hydrogen plasma von Bramble, James, Moynihan, Cody, Stemmley, Steven, Stermer, Jackson, Robertson, Jaime, Weissburg, Natalie, Ruzic, David N.

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Elastic scattering cross sections and transport of tin ions in extreme ultraviolet lithography sources von Bartlett, Nathan, Herschberg, Andrew, Crouse, Jameson, Dallal, Tamar, Nuttal, Jake, Stahl, Jack, Braaksma, Niels, Ruzic, David

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Sub-damage-threshold plasma etching and profile tailoring of Si through laser-stimulated thermal desorption von Peck, Jason A., Ruzic, David N.

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