Valleytronics: Opportunities, Challenges, and Paths Forward von Vitale, Steven A., Nezich, Daniel, Varghese, Joseph O., Kim, Philip, Gedik, Nuh, Jarillo‐Herrero, Pablo, Xiao, Di, Rothschild, Mordechai

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Aluminum plasmonics: optimization of plasmonic properties using liquid-prism-coupled ellipsometry von Diest, Kenneth, Liberman, Vladimir, Lennon, Donna M, Welander, Paul B, Rothschild, Mordechai

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Wafer-scale fabrication of CMOS-compatible, high aspect ratio encapsulated nanochannels von Smith, Melissa Alyson, Weaver, Isaac, Rothschild, Mordechai

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Electrically switchable diffractive waveplates with metasurface aligned liquid crystals von Chou, Jeffrey, Parameswaran, Lalitha, Kimball, Brian, Rothschild, Mordechai

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Engineered liquid crystal anchoring energies with nanopatterned surfaces von Gear, Christopher, Diest, Kenneth, Liberman, Vladimir, Rothschild, Mordechai

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Optical nondestructive dynamic measurements of wafer-scale encapsulated nanofluidic channels von Liberman, Vladimir, Smith, Melissa, Weaver, Isaac, Rothschild, Mordechai

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Projection optical lithography von Rothschild, Mordechai

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Predicting the Thermal Behavior in Functional Textile Fibers Having Embedded Electronics von Berry, Shaun, Redmond, Shawn, Wang, Tairan, Rothschild, Mordechai

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Fluidic microoptics with adjustable focusing and beam steering for single cell optogenetics von Berry, Shaun, Redmond, Shawn, Robinson, Paul, Thorsen, Todd, Rothschild, Mordechai, Boyden, Edward S

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Nanochannel fabrication based on double patterning with hydrogen silsesquioxane von Diest, Kenneth, Goodman, Russell, Rothschild, Mordechai

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Polymeric Photonic Crystal Fibers for Textile Tracing and Sorting von Iezzi, Brian, Coon, Austin, Cantley, Lauren, Perkins, Bradford, Doran, Erin, Wang, Tairan, Rothschild, Mordechai, Shtein, Max

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Valleytronics: Valleytronics: Opportunities, Challenges, and Paths Forward (Small 38/2018) von Vitale, Steven A., Nezich, Daniel, Varghese, Joseph O., Kim, Philip, Gedik, Nuh, Jarillo‐Herrero, Pablo, Xiao, Di, Rothschild, Mordechai

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22-nm immersion interference lithography von Bloomstein, T M, Marchant, Michael F, Deneault, Sandra, Hardy, Dennis E, Rothschild, Mordechai

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Wafer-Scale Aluminum Nanoplasmonic Resonators with Optimized Metal Deposition von Liberman, Vladimir, Diest, Kenneth, Stull, Corey W, Cook, Matthew T, Lennon, Donna M, Rothschild, Mordechai, Schoeche, Stefan

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Retroreflectors for remote readout of colorimetric sensors von Switkes, Michael, Ervin, Benjamin L., Kingsborough, Richard P., Rothschild, Mordechai, Sworin, Michael

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An analytical method to study the effects of a substrate in surface-enhanced Raman scattering von Huang, Shao Ying, Wu, Bae-Ian, Zhang, Baile, Lee, Yee Hui, Liberman, Vladimir, Rothschild, Mordechai

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Supplemental multilevel interconnects by laser direct writing: application to GaAs digital integrated circuits von BLACK, J. G, DORAN, S. P, ROTHSCHILD, M, EHRLICH, D. J

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RESIST PROCESSES FOR ArF EXCIMER LASER LITHOGRAPHY von KUNZ, RODERICK R., HARTNEY, MARK A., HORN, MARK W., KEAST, CRAIG L., ROTHSCHILD, MORDECHAI, SHAVER, DAVID C.

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ARTICLE TRACKING von COON, Austin, PERKINS, Bradford C, CANTLEY, Lauren, WANG, Tairan, SHTEIN, Max, ROTHSCHILD, Mordechai, IEZZI, Brian

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SEISMIC WAVE DAMPING SYSTEM von LIBERMAN, Vladimir, ROTHSCHILD, Mordechai, HAUPT, Robert

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