Ionic Field Effect Transistors with Sub-10 nm Multiple Nanopores von Nam, Sung-Wook, Rooks, Michael J, Kim, Ki-Bum, Rossnagel, Stephen M

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Atomic layer deposition of Ge2Sb2Te5 thin films von RITALA, Mikko, PORE, Viljami, HATANPÄÄ, Timo, HEIKKILA, Mikko, LESKELÄ, Markku, MIZOHATA, Kenichiro, SCHROTT, Alejandro, RAOUX, Simone, ROSSNAGEL, Stephen M

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Electrochemical Characterization of Thin Film Electrodes Toward Developing a DNA Transistor von Harrer, Stefan, Ahmed, Shafaat, Afzali-Ardakani, Ali, Luan, Binquan, Waggoner, Philip S, Shao, Xiaoyan, Peng, Hongbo, Goldfarb, Dario L, Martyna, Glenn J, Rossnagel, Stephen M, Deligianni, Lili, Stolovitzky, Gustavo A

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Magnetron sputtering von Rossnagel, Stephen M.

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Morphological stability and specific resistivity of sub-10 nm silicide films of Ni1−xPtx on Si substrate von Zhang, Zhen, Zhang, Shi-Li, Yang, Bin, Zhu, Yu, Rossnagel, Stephen M., Gaudet, Simon, Kellock, Andrew J., Jordan-Sweet, Jean, Lavoie, Christian

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Handbook of Ion Beam Processing Technology - Principles, Deposition, Film Modification and Synthesis von Cuomo, Jerome J, Rossnagel, Stephen M, Kaufman, Harold R

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Electrochemical protection of thin film electrodes in solid state nanopores von Harrer, Stefan, Waggoner, Philip S, Luan, Binquan, Afzali-Ardakani, Ali, Goldfarb, Dario L, Peng, Hongbo, Martyna, Glenn, Rossnagel, Stephen M, Stolovitzky, Gustavo A

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Oxygen migration in TiO2-based higher-k gate stacks von Kim, SangBum, Brown, Stephen L., Rossnagel, Stephen M., Bruley, John, Copel, Matthew, Hopstaken, Marco J. P., Narayanan, Vijay, Frank, Martin M.

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Numerical simulation of etching and deposition processes von HAMAGUCHI, S, MAYO, A. A, ROSSNAGEL, S. M, KOTECKI, D. E, MILKOVE, K. R, WANG, C, FARRELL, C. E

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Increasing the speed of solid-state nanopores von Waggoner, Philip S., Kuan, Aaron T., Polonsky, Stas, Peng, Hongbo, Rossnagel, Stephen M.

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Functionalizing a Nanopore with Nano-Electrodes Towards the Control of the Translocation of DNA with Single Base Resolution von Peng, Hongbo, Luan, Binquan, Waggoner, Philip S., Harrer, Stefan, Martyna, Glenn J., Polonsky, Stanislav, Rossnagel, Stephen M., Stolovitzky, Gustavo

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Handbook of Plasma Processing Technology - Fundamentals, Etching, Deposition, and Surface Interactions von Rossnagel S.M, Westwood W.D, Cuomo J.J

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Oxygen migration in TiO{sub 2}-based higher-k gate stacks von Kim, Sang Bum, Brown, Stephen L., Rossnagel, Stephen M., Bruley, John, Copel, Matthew, Hopstaken, Marco J. P., Narayanan, Vijay, Frank, Martin M.

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Oxygen migration in TiO 2 -based higher- k gate stacks von Kim, SangBum, Brown, Stephen L., Rossnagel, Stephen M., Bruley, John, Copel, Matthew, Hopstaken, Marco J. P., Narayanan, Vijay, Frank, Martin M.

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Atomic Layer Deposition of Materials for Phase-Change Memories von Leskelä, Markku, Pore, Viljami, Hatanpää, Timo, Heikkilä, Mikko, Ritala, Mikko, Schrott, Alejandro, Raoux, Simone, Rossnagel, Stephen

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Morphological stability and specific resistivity of sub-10 nm silicide films of Ni 1 − x Pt x on Si substrate von Zhang, Zhen, Zhang, Shi-Li, Yang, Bin, Zhu, Yu, Rossnagel, Stephen M., Gaudet, Simon, Kellock, Andrew J., Jordan-Sweet, Jean, Lavoie, Christian

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Morphological stability and specific resistivity of sub-10 nm silicide films of Ni[sub 1 - x]Pt[sub x] on Si substrate von Zhang, Zhen, Shi-Li, Zhang, Bin, Yang, Yu, Zhu, Stephen, M. Rossnagel, Simon, Gaudet, Andrew, J. Kellock, Jean, Jordan-Sweet, Christian, Lavoie

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Atomic layer deposition of Ge@@d2@Sb@@d2@Te@@d5@ thin films von Ritala, Mikko, Pore, Viljami, Hatanpaeae, Timo, Heikkilae, Mikko, Leskelae, Markku, Mizohata, Kenichiro, Schrott, Alejandro, Raoux, Simone, Rossnagel, Stephen M

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Handbook of Plasma Processing Technology: Fundamental, Etching, Deposition and Surface Interactions von Rossnagel, Stephen M, Westwood, William D, Cuomo, Jerome J

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Atomic layer deposition of Ge 2Sb 2Te 5 thin films von Ritala, Mikko, Pore, Viljami, Hatanpää, Timo, Heikkilä, Mikko, Leskelä, Markku, Mizohata, Kenichiro, Schrott, Alejandro, Raoux, Simone, Rossnagel, Stephen M.

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