Multi-Trigger Resist for EUV lithography von Popescu, C., O'Callaghan, G., Storey, C., McClelland, A., Roth, J., Jackson, E., Robinson, A.P.G.

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Process and Sensitivity Optimisation of the Multi-Trigger Resist von Popescu, C., O'Callaghan, G., Storey, C., McClelland, A., Roth, J., Jackson, E., Robinson, A.P.G.

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Investigating High Opacity and Increased Activation Energy in the Multi-Trigger Resist von Popescu, C., O'Callaghan, G., McClelland, A., Roth, J., Lada, T., Kudo, T., Dammel, R., Moinpour, M., Cao, Y., Robinson, A.P.G.

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Chemically amplified molecular resists for electron beam lithography von Robinson, A.P.G., Zaid, H.M., Gibbons, F.P., Palmer, R.E., Manickam, M., Preece, J.A., Brainard, R., Zampini, T., O’Connell, K.

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Direct e-beam lithography of PDMS von Bowen, J., Cheneler, D., Robinson, A.P.G.

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Performance of a high resolution chemically amplified electron beam resist at various beam energies von Yang, D.X., Frommhold, A., McClelland, A., Roth, J., Rosamond, M., Linfield, E.H., Osmond, J., Palmer, R.E., Robinson, A.P.G.

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Fullerene-based spin-on-carbon hardmask von Frommhold, A., Manyam, J., Palmer, R.E., Robinson, A.P.G.

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Functionalization of Fullerene for Electron Beam Nanolithography Resist von Tada, Tetsuya, Kanayama, Toshihiko, Robinson, A.P.G., Palmer, R.E., Preece, J.A.

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Suppression of pinhole defects in fullerene molecular electron beam resists von Chen, X., Robinson, A.P.G., Manickam, M., Preece, J.A.

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Chemically amplified molecular resists for e-beam lithography von Gibbons, F.P., Manyam, J., Diegoli, S., Manickam, M., Preece, J.A., Palmer, R.E., Robinson, A.P.G.

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Anomalous acid diffusion in a triphenylene molecular resist with melamine crosslinker von Zaid, H.M., Manickam, M., Preece, J.A., Palmer, R.E., Robinson, A.P.G.

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Exposure mechanism of fullerene derivative electron beam resists von Robinson, A.P.G, Palmer, R.E, Tada, T, Kanayama, T, Shelley, E.J, Philp, D, Preece, J.A

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Electron beam induced fragmentation of fullerene derivatives von Robinson, A.P.G., Palmer, R.E., Tada, T., Kanayama, T., Preece, J.A., Philp, D., Jonas, U., Deiderich, F.

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A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution von Tada, T., Kanayama, T., Robinson, A.P.G., Palmer, R.E., Allen, M.T., Preece, J.A., Harris, K.D.M.

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Chemically Amplified Molecular Resists for E-Beam Lithography von Manyam, J., Gibbons, F.P., Diegoli, S., Manickam, M., Preece, J.A., Palmer, R.E., Robinson, A.P.G.

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