Super critical thickness SiGe-channel heterostructure p -type metal-oxide-semiconductor field-effect transistors using laser spike annealing von Ní Chléirigh, Cáit, Wang, XiaoRu, Rimple, Gana, Wang, Yun, David Theodore, N., Canonico, Michael, Hoyt, Judy L.

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Laser Spike Annealing of Strained Si/ Strained Si0.3Ge0.7/ Relaxed Si0.7Ge0.3 Dual Channel High Mobility p-MOSFETs von Ni Chleirigh, Cait, Wang, Xiaoru, Rimple, Gana, Wang, Yun, Canonico, Michael, Theodore, David D., Olubuyide, Oluwamuyiwa, Hoyt, Judy L.

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Laser Spike Annealing of Strained Si/ Strained Si0.3Ge0.7/ Relaxed Si0.7Ge0.3 Dual Channel High Mobility p-MOSFETs von Ni Chleirigh, Cait, Wang, Xiaoru, Rimple, Gana, Wang, Yun, Canonico, Michael, Olubuyide, Oluwamuyiwa, Hoyt, Judy L.

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Substrate processing system configurable for deposition or cleaning von GUPTA, ANAND, PONNEKANTI, SRIHARI, RIMPLE, GANA A, MURUGESH, LAXMAN

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Using ceramic wafer to protect susceptor during cleaning of a processing chamber von GUPTA, ANAND, PONNEKANTI, SRIHARI, RIMPLE, GANA A, MURUGESH, LAXMAN

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USING CERAMIC WAFER TO PROTECT SUSCEPTOR DURING CLEANING OF A PROCESSING CHAMBER von LAXMAN, MURUGESH, GANA, A RIMPLE, ANAND, GUPTA, SRIHARA, PONNEKANTI

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