How complexing with a small number of transition metal ions can prevent dye fading von Reiser, Arnost

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Effect of Hydrogen Acceptors on pKa of Phenolic Resins:  Link to Dissolution Inhibition von YAN, Zhenglin, REISER, Arnost

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On the physical meaning of the Kwei equation for the glass transition temperature of polymer blends von Lin, Anshyang A, Kwei, T. K, Reiser, Arnost

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Percolation View of Novolak Dissolution. 5. The Dissolution of Exposed Resist Films von Shih, Hsiao-Yi, Reiser, Arnost

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A Percolation View of Novolak Dissolution. 4. Mechanism of Inhibitor Action von Shih, Hsiao-Yi, Reiser, Arnost

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Percolation view of novolak dissolution and dissolution inhibition von Yeh, Tung Feng, Shih, Hsiao Yi, Reiser, Arnost

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A percolation view of novolak dissolution. 2. The statistics of a three-dimensional cubic percolation field and a generalized scaling law von Yeh, Tung Feng, Reiser, Arnost, Dammel, Ralph R, Pawlowski, Gerhard, Roeschert, Horst

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The dissolution of novolak in aqueous alkali von Huang, Jian Ping, Kwei, T. K, Reiser, Arnost

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A Percolation View of Novolak Dissolution. 3. Dissolution Inhibition von Shih, Hsiao-Yi, Yeh, Tung-Feng, Reiser, Arnost, Dammel, Ralph R, Merrem, Hans J, Pawlowski, Gerhard

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Effect of Hydrogen Acceptors on p K a of Phenolic Resins:  Link to Dissolution Inhibition von Yan, Zhenglin, Reiser, Arnost

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Distribution of site reactivities in photoreactive amorphous solids von Pitts, Eric, Reiser, Arnost

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On the Mechanism of Dissolution Inhibition in Phenolic Resins von Lin, Chen-Chy, Yeh, Tung-Feng, Reiser, Arnost, Honda, Kenji, Beauchemin, Bernard T.

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Percolation View of Novolak Dissolution. 7. The Effect of Salts von Kim, Myoung Soo, Reiser, Arnost

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Mechanism of the Trefonas Effect (Polyphotolysis) in Novolak−Diazonaphthoquinone Resists von Han, Yu-Kai, Yan, Zhenglin, Reiser, Arnost

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Radiative and nonradiative transitions from the first excited singlet state of methyl-substituted naphthalenes von Reiser, Arnost, Wright, T. R.

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RESISTE MIT VERBESSERTER AUFLÖSUNGSINHIBIERUNG FÜR DIE MIKROLITHOGRAPHIE von REISER, ARNOST

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IMPROVED DISSOLUTION INHIBITION RESISTS FOR MICROLITHOGRAPHY von REISER, ARNOST

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Reactant preordering in solid polymer matrices: photo-cross-linking in blends of donor- and acceptor-substituted poly(vinyl cinnamates) von LIN, A. A, REISER, A

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Dissolution inhibition resists for microlithography von REISER ARNOST

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IMPROVED DISSOLUTION INHIBITION RESISTS FOR MICROLITHOGRAPHY von REISER, ARNOST

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