Measurement of Individual Particle Atomic Composition by Aerosol Mass Spectrometry von Reents, William D, Schabel, Michael J

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Corrosion of RoHS-Compliant Surface Finishes in Corrosive Mixed Flowing Gas Environments von Hannigan, K., Reid, M., Collins, M.N., Dalton, E., Xu, C., Wright, B., Demirkan, K., Opila, R.L., Reents, W.D., Franey, J.P., Fleming, D.A., Punch, J.

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Sequential clustering reactions of SiD+ with SiD4 : rapid growth to kinetic dead-end structures von MANDICH, M. L, REENTS, W. D

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Sequential reactions of SiD2+ with SiD4 von REENTS, W. D, MANDICH, M. L

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Single Particle Characterization by Time-of-Flight Mass Spectrometry von Reents, W. D., Downey, S. W., Emerson, A. B., Mujsce, A. M., Muller, A. J., Siconolfi, D. J., Sinclair, J. D., Swanson, A. G.

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Reactive etching of GaxAsy- by HCl von REENTS, W. D

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Simultaneous Elemental Composition and Size Distributions of Submicron Particles in Real Time Using Laser Atomization Ionization Mass Spectrometry von Reents, William D., Ge, Zhaozhu

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Water induced particle formation in the ion chemistry of silane von Jr, W D Reents, Mandich, M L

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How to grow large clusters from SixDy+ ions in silane or disilane : water them von MANDICH, M. L, REENTS, W. D

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Interconnection Reliability Assessment for Electronic Equipment Exposed to Chlorine Dioxide Used for Biological Decontamination von Xu, C, Fleming, D, Mandich, M L, Reents, W D, Derkits, G E, Franey, J P, Kopf, R, Ryan, S

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Reliability of electronic equipment exposed to chlorine dioxide used for biological decontamination von Derkits, G E, Mandich, M L, Reents, W D, Franey, J P, Xu, C, Fleming, D, Kopf, R, Ryan, S

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The effects of chloro substitution on the electronic structure of ClCr+, ClMn+, and ClFe+ and their reactivity with small alkanes von Mandich, Mary L, Steigerwald, M. L, Reents, W. D

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Sequential clustering reactions of Si+ with SiD4: identification of a bottleneck preventing rapid growth of hydrogenated silicon particles von MANDICH, M. L, REENTS, W. D. JR, JARROLD, M. F

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Chemical properties of small silicon clusters von Mandich, M. L., Reents, W. D., Kolenbrander, K. D.

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Impurities in boron trichloride and boron trifluoride determined by Fourier transform mass spectrometry von Reents, W. D

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High pressure chemistry in a Fourier transform ion cyclotron resonance mass spectrometer using a split-pair magnet von Reents, William D.

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Real-time compositional analysis of submicrometre particles von Jr, W D Reents, Downey, S W, Emerson, A B, Mujsce, A M, Muller, A J, Siconolfi, D J, Sinclair, J D, Swanson, A G

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Sequential reactions of bare silicon clusters with SiD4: constrained heterogeneous nucleation of deuterated silicon particles von MANDICH, M. L, REENTS, W. D. JR

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Purity of III/V semiconductor precursors: trimethylgallium, triethylgallium, ethyldimethylindium, arsine, trimethylarsine and phosphine von Reents, W.D.

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Corrosion of Cu under Highly Corrosive Environments von Demirkan, K., Derkits, G. E., Fleming, D. A., Franey, J. P., Hannigan, K., Opila, R. L., Punch, J., Reents, W. D., Reid, M., Wright, B., Xu, C.

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