Control of semiconductor manufacturing equipment: real-time feedback control of a reactive ion etcher von Rashap, B.A., Lafortune, S., Moyne, J.R., Teneketzis, D., Terry, F.L., Elta, M.E., Etemad, H., Fournier, J.P., Freudenberg, J.S., Giles, M.D., Grizzle, J.W., Kabamba, P.T., Khargonekar, P.P.

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A feedback limitation of decentralized controllers for TITO systems, with application to a reactive ion etcher von Freudenberg, J.S., Grizzle, J.W., Rashap, B.A.

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Nonlinear system identification and control of a reactive ion etcher von Vincent, T.L., Khargonekar, P.P., Rashap, B.A., Terry, E., Elta, M.

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Real-time control of reactive ion etching: identification and disturbance rejection von Rashap, B.A., Khargonekar, P.P., Grizzle, J.W., Elta, M.E., Freudenberg, J.S., Terry, F.L.

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