Effects of nitrogen trifluoride on the properties of plasma-enhanced chemical-vapor-deposited semi-insulating polysilicon films von Ranade, R.M., Ang, S.S., Brown, W.D.

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Properties of fluorinated amorphous silicon-nitrogen-oxygen alloy (a-SiN xO y:H) deposited by plasma-enhanced chemical vapor deposition von Ranade, R.M., Ang, S.S., Brown, W.D.

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Current-voltage-time characteristics of aluminum/polyimide/ p+-silicon structures von Ranade, R.M., Ang, S.S., Brown, W.D., Ulrich, R.K.

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Polyimide-passivated pn diodes von Ang, S.S., Ulrich, R.K., Brown, W.D., Ranade, R.M.

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Semi-insulating polysilicon heterojunctions on silicon von Ranade, R.M., Ang, S.S., Brown, W.D., Naseem, H.A., Yeargan, J.R., Ulrich, R.K.

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Control education for societal-scale challenges: a community roadmap von Rossiter, J.A, Cassandras, C.G, Hespanha, J, Dormido, S, de la Torre, L, Ranade, G, Visioli, A, Hedengren, J, Murray, R.M, Antsaklis, P, Lamnabhi-Lagarrigue, F, Parisini, T

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