On the film density using high power impulse magnetron sputtering von Samuelsson, Mattias, Lundin, Daniel, Jensen, Jens, Raadu, Michael A., Gudmundsson, Jon Tomas, Helmersson, Ulf

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On three different ways to quantify the degree of ionization in sputtering magnetrons von Butler, Alexandre, Brenning, Nils, Raadu, Michael A, Gudmundsson, Jon Tomas, Minea, Tiberiu, Lundin, Daniel

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On sheath energization and Ohmic heating in sputtering magnetrons von Huo, Chunqing, Lundin, Daniel, Raadu, Michael A, Anders, André, Gudmundsson, Jon Tomas, Brenning, Nils

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On the road to self-sputtering in high power impulse magnetron sputtering: particle balance and discharge characteristics von Huo, Chunqing, Lundin, Daniel, Raadu, Michael A, Anders, André, Gudmundsson, Jon Tomas, Brenning, Nils

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Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses von Huo, Chunqing, Raadu, Michael A, Lundin, Daniel, Gudmundsson, Jon Tomas, Anders, André, Brenning, Nils

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Transition between the discharge regimes of high power impulse magnetron sputtering and conventional direct current magnetron sputtering von Lundin, Daniel, Brenning, Nils, Jädernäs, Daniel, Larsson, Petter, Wallin, Erik, Lattemann, Martina, Raadu, Michael A, Helmersson, Ulf

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Bipolar HiPIMS for tailoring ion energies in thin film deposition von Keraudy, Julien, Viloan, Rommel Paulo B., Raadu, Michael A., Brenning, Nils, Lundin, Daniel, Helmersson, Ulf

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Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputtering von Rudolph, Martin, Brenning, Nils, Raadu, Michael A., Hajihoseini, Hamidreza, Gudmundsson, Jon Tomas, Anders, André, Lundin, Daniel

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Optimization of HiPIMS discharges: The selection of pulse power, pulse length, gas pressure, and magnetic field strength von Brenning, Nils, Butler, Alexandre, Hajihoseini, Hamidreza, Rudolph, Martin, Raadu, Michael A., Gudmundsson, Jon Tomas, Minea, Tiberiu, Lundin, Daniel

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On working gas rarefaction in high power impulse magnetron sputtering von Barynova, Kateryna, Rudolph, Martin, Suresh Babu, Swetha, Fischer, Joel, Lundin, Daniel, Raadu, Michael A, Brenning, Nils, Gudmundsson, Jon Tomas

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HiPIMS optimization by using mixed high-power and low-power pulsing von Brenning, Nils, Hajihoseini, Hamidreza, Rudolph, Martin, Raadu, Michael A, Gudmundsson, Jon Tomas, Minea, Tiberiu M, Lundin, Daniel

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On how to measure the probabilities of target atom ionization and target ion back-attraction in high-power impulse magnetron sputtering von Rudolph, Martin, Hajihoseini, Hamidreza, Raadu, Michael A., Gudmundsson, Jon Tomas, Brenning, Nils, Minea, Tiberiu M., Anders, André, Lundin, Daniel

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On the electron energy distribution function in the high power impulse magnetron sputtering discharge von Rudolph, Martin, Revel, Adrien, Lundin, Daniel, Hajihoseini, Hamidreza, Brenning, Nils, Raadu, Michael A., Anders, Andre, Minea, Tiberiu M., Gudmundsson, Jon Tomas

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Modeling of high power impulse magnetron sputtering discharges with tungsten target von Babu, Swetha Suresh, Rudolph, Martin, Lundin, Daniel, Shimizu, Tetsuhide, Fischer, Joel, Raadu, Michael A, Brenning, Nils, Gudmundsson, Jon Tomas

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The Effect of Magnetic Field Strength and Geometry on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge von Hajihoseini, Hamidreza, Čada, Martin, Hubička, Zdenek, Ünaldi, Selen, Raadu, Michael A., Brenning, Nils, Gudmundsson, Jon Tomas, Lundin, Daniel

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Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge von Rudolph, M, Brenning, N, Hajihoseini, H, Raadu, M A, Minea, T M, Anders, A, Gudmundsson, J T, Lundin, D

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A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetrons von Brenning, N, Gudmundsson, J T, Raadu, M A, Petty, T J, Minea, T, Lundin, D

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Particle-balance models for pulsed sputtering magnetrons von Huo, Chunqing, Lundin, D, Gudmundsson, J T, Raadu, M A, Bradley, J W, Brenning, N

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An ionization region model of the reactive Ar/O 2 high power impulse magnetron sputtering discharge von Gudmundsson, J T, Lundin, D, Brenning, N, Raadu, M A, Huo, Chunqing, Minea, T M

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Target ion and neutral spread in high power impulse magnetron sputtering von Hajihoseini, H., Brenning, N., Rudolph, M., Raadu, M. A., Lundin, D., Fischer, J., Minea, T. M., Gudmundsson, J. T.

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